Applied materials, inc. (20250087462). RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE
RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE
Organization Name
Inventor(s)
Yue Guo of Redwood City CA (US)
Kartik Ramaswamy of San Jose CA (US)
A N M Wasekul Azad of Santa Clara CA (US)
Nicolas J. Bright of Arlington WA (US)
Yang Yang of San Diego CA (US)
RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE
This abstract first appeared for US patent application 20250087462 titled 'RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE
Original Abstract Submitted
embodiments provided herein generally include apparatus, plasma processing systems and methods for tuning in a radio frequency (rf) plasma processing system for improving substrate processing metrics. some embodiments are directed to a method for processing a substrate in a plasma processing system. the method generally includes: sensing, via one or more sensors, one or more intermodulation or harmonic components of a signal at a node coupled to a plasma chamber; and controlling one or more signal processing devices of the plasma processing system to process the substrate based on the one or more intermodulation or harmonic components and in accordance with a frequency domain configuration identified by analyzing one or more substrate processing metrics.
