Category:Kartik Ramaswamy of San Jose CA (US)
Kartik Ramaswamy
Kartik Ramaswamy from San Jose CA (US) has applied for patents in technology areas such as H01J37/32 with applied materials, inc..
Patents
Pages in category "Kartik Ramaswamy of San Jose CA (US)"
The following 20 pages are in this category, out of 20 total.
1
- 17835864. PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS simplified abstract (Applied Materials, Inc.)
- 17947675. WIDEBAND VARIABLE IMPEDANCE LOAD FOR HIGH VOLUME MANUFACTURING QUALIFICATION AND ON-SITE DIAGNOSTICS simplified abstract (Applied Materials, Inc.)
- 17960666. IN-SITU ELECTRIC FIELD DETECTION METHOD AND APPARATUS simplified abstract (Applied Materials, Inc.)
- 17988083. METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE simplified abstract (Applied Materials, Inc.)
- 18059222. SOLID-STATE SWITCH BASED HIGH-SPEED PULSER WITH PLASMA IEDF MODIFICATION CAPABILITY THROUGH MULTILEVEL OUTPUT FUNCTIONALITY simplified abstract (Applied Materials, Inc.)
- 18059658. SYSTEM AND METHODS FOR IMPLEMENTING A MICRO PULSING SCHEME USING DUAL INDEPENDENT PULSERS simplified abstract (Applied Materials, Inc.)
- 18076725. LEARNING BASED TUNING IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER simplified abstract (Applied Materials, Inc.)
- 18209348. IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES (Applied Materials, Inc.)
- 18244202. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.)
- 18612757. PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS simplified abstract (Applied Materials, Inc.)
- 18628009. PLASMA EXCITATION WITH ION ENERGY CONTROL simplified abstract (Applied Materials, Inc.)
- 18943632. IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS (Applied Materials, Inc.)
A
- Applied materials, inc. (20240249915). PLASMA EXCITATION WITH ION ENERGY CONTROL simplified abstract
- Applied materials, inc. (20240258070). PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS simplified abstract
- Applied materials, inc. (20240266152). PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS simplified abstract
- Applied materials, inc. (20240412947). RADIO-FREQUENCY (RF) MATCHING NETWORK FOR FAST IMPEDANCE TUNING
- Applied materials, inc. (20240420921). IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Applied materials, inc. (20250069921). IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS
- Applied materials, inc. (20250087462). RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE