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Category:G03F1/82
Subcategories
This category has the following 12 subcategories, out of 12 total.
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Pages in category "G03F1/82"
The following 26 pages are in this category, out of 26 total.
1
- 17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18435960. PHOTOLITHOGRAPHY PATTERNING METHOD simplified abstract (KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY)
- 18501615. METHOD FOR OPTIMIZING PHOTOMASK (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18517828. CLEANING METHOD FOR PHOTO MASKS AND APPARATUS THEREFOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18526038. PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18664027. HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSPECTION OF MASK PODS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18813332. SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM (Tokyo Electron Limited)
- 18946683. METHOD OF FABRICATING AND SERVICING A PHOTOMASK (Taiwan Semiconductor Manufacturing Company, LTD.)
- 18978369. RETICLE CLEANING DEVICE AND METHOD OF USE (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 19011395. LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT (Taiwan Semiconductor Manufacturing Company, Ltd.)
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- Taiwan semiconductor manufacturing co., ltd. (20240329517). PELLICLE HAVING VENT HOLE simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20250110414). RETICLE CLEANING DEVICE AND METHOD OF USE
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on April 3rd, 2025
- Taiwan semiconductor manufacturing company, ltd. (20240295826). HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSPECTION OF MASK PODS simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377766). SYSTEM AND METHOD FOR CLEANING AN EUV MASK simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20250068060). METHOD OF FABRICATING AND SERVICING A PHOTOMASK
- Taiwan semiconductor manufacturing company, ltd. (20250147411). METHOD FOR OPTIMIZING PHOTOMASK
- Taiwan semiconductor manufacturing company, ltd. (20250147424). LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT
- Taiwan Semiconductor Manufacturing Company, LTD. patent applications on February 27th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 14th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on May 8th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on September 5th, 2024