Taiwan semiconductor manufacturing company, ltd. (20250147411). METHOD FOR OPTIMIZING PHOTOMASK
METHOD FOR OPTIMIZING PHOTOMASK
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Yen-Tung Hu of Hsinchu County TW
METHOD FOR OPTIMIZING PHOTOMASK
This abstract first appeared for US patent application 20250147411 titled 'METHOD FOR OPTIMIZING PHOTOMASK
Original Abstract Submitted
a method includes receiving a layout; performing an optimization process to the layout to generate an optimized layout, wherein the optimization process comprising simulating a mask image of a photomask based on the layout; simulating an aerial image projected on a photoresist layer based on the mask image; simulating a resist image of the photoresist layer based on the aerial image; simulating an etch image of a layer underneath the photoresist layer based on the resist image; and performing an inverse lithographic technology (ilt) process to generate the optimized layout, wherein the ilt process is performed based on the mask image, the aerial image, the resist image, and the etch image; and fabricating a photomask based on the optimized layout.