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Category:G03F1/70
Subcategories
This category has the following 15 subcategories, out of 15 total.
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Pages in category "G03F1/70"
The following 68 pages are in this category, out of 68 total.
1
- 17377634. METHOD FOR IMPROVED POLYSILICON ETCH DIMENSIONAL CONTROL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17821004. METHOD FOR OBTAINING AN EXPOSURE DATA AND METHOD FOR MANUFACTURING AN EXPOSURE MASK USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18062231. OVERLAY CORRECTING METHOD, AND PHOTOLITHOGRAPHY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SCANNER SYSTEM BASED ON THE OVERLAY CORRECTING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18080431. TWO-DIMENSIONAL (2D) PATTERNS USING MULTIPLE EXPOSURES OF ONE-DIMENSIONAL (1D) PHOTOLITHOGRAPHY MASKS OR HOLOGRAPHIC INTERFERENCE LITHOGRAPHY simplified abstract (Google LLC)
- 18171729. CLUSTERED IC DIES TO INCREASE IC DIES PER WAFER simplified abstract (GlobalFoundries U.S. Inc.)
- 18379786. SYSTEM AND METHOD FOR PATTERNED LAYER DESIGN AND FORMATION (Taiwan Semiconductor Manufacturing Company Limited)
- 18381773. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18421644. INTEGRATED CIRCUIT LAYOUT GENERATION METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18449078. OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND METHOD OF MANUFACTURING MASK BY USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18454219. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18462796. METHOD OF CORRECTING EUV OVERLAY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18526038. PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18532757. OVERLAY IMPROVEMENT METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING OVERLAY IMPROVEMENT METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18535149. OVERLAY CORRECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD COMPRISING THE OVERLAY CORRECTION METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18635209. Method Of Critical Dimension Control By Oxygen And Nitrogen Plasma Treatment In Euv Mask simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18676537. SEMICONDUCTOR DEVICE INCLUDING STANDARD CELL HAVING SPLIT PORTIONS simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.)
- 18814428. MASK OPTIMIZATION FOR LAYER ACCOUNTING FOR OVERLAP WITH OTHER LAYERS (D2S, Inc.)
- 18814439. CONCURRENT MASK OPTIMIZATION FOR MULTIPLE LAYERS (D2S, Inc.)
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- Samsung electronics co., ltd. (20240176230). METHOD OF CORRECTING EUV OVERLAY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE INCLUDING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240201578). OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND METHOD OF MANUFACTURING MASK BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240222201). METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240272544). METHOD OF MANUFACTURING A PHOTOMASK simplified abstract
- Samsung electronics co., ltd. (20240280895). METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240310719). OVERLAY IMPROVEMENT METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING OVERLAY IMPROVEMENT METHOD simplified abstract
- Samsung electronics co., ltd. (20240310720). OVERLAY CORRECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD COMPRISING THE OVERLAY CORRECTION METHOD simplified abstract
- Samsung electronics co., ltd. (20240321580). PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240353748). METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- Samsung Electronics Co., Ltd. patent applications on August 15th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on August 15th, 2024
- Samsung Electronics Co., Ltd. patent applications on August 22nd, 2024
- Samsung Electronics Co., Ltd. patent applications on January 23rd, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on January 23rd, 2025
- Samsung Electronics Co., Ltd. patent applications on July 4th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on July 4th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 20th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on June 20th, 2024
- Samsung Electronics Co., Ltd. patent applications on May 30th, 2024
- Samsung Electronics Co., Ltd. patent applications on October 24th, 2024
- Samsung Electronics Co., Ltd. patent applications on September 19th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on September 19th, 2024
- Samsung Electronics Co., Ltd. patent applications on September 26th, 2024
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- Taiwan semiconductor manufacturing co., ltd. (20240160828). INTEGRATED CIRCUIT LAYOUT GENERATION METHOD simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240186258). PHOTOLITHOGRAPHY ALIGNMENT PROCESS FOR BONDED WAFERS simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240330564). SEMICONDUCOTR DEVICE HAVING POWER RAIL WITH NON-LINEAR EDGE simplified abstract
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on June 6th, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on May 16th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240264520). Method Of Critical Dimension Control By Oxygen And Nitrogen Plasma Treatment In Euv Mask simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377755). MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20250004383). METHOD OF PRODUCING MASK DATA FOR SEMICONDUCTOR DEVICE MANUFACTURING
- Taiwan semiconductor manufacturing company, ltd. (20250063709). MEMORY CELL WITH BURIED POWER GRID, AND METHOD OF FABRICATING SAME
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 8th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on February 20th, 2025
- Taiwan Semiconductor Manufacturing Company, LTD. patent applications on February 6th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on January 18th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on January 2nd, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
- TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED patent applications on February 13th, 2025
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- US Patent Application 18231070. OPTIMIZED MASK STITCHING simplified abstract
- US Patent Application 18354377. INTEGRATED CIRCUIT AND METHOD OF FORMING THE SAME simplified abstract
- US Patent Application 18359447. MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS simplified abstract
- US Patent Application 18361815. SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18447425. SUB-RESOLUTION ASSIST FEATURES simplified abstract
- US Patent Application 18447810. METHOD FOR IMPROVED POLYSILICON ETCH DIMENSIONAL CONTROL simplified abstract