Samsung electronics co., ltd. (20240272544). METHOD OF MANUFACTURING A PHOTOMASK simplified abstract
METHOD OF MANUFACTURING A PHOTOMASK
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METHOD OF MANUFACTURING A PHOTOMASK - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240272544 titled 'METHOD OF MANUFACTURING A PHOTOMASK
The method of manufacturing a photomask involves designing a layout of a target pattern, modeling a displacement error of the target pattern, generating a displacement error correction map, performing an exposure process on a blank mask based on the correction map, and conducting developing and etching processes to form the photomask.
- Design layout of target pattern
- Model displacement error of target pattern
- Generate displacement error correction map
- Perform exposure process on blank mask
- Conduct developing and etching processes
Potential Applications: - Semiconductor manufacturing - Microelectronics industry - Optical device fabrication
Problems Solved: - Improving accuracy of photomask production - Enhancing quality of target pattern formation - Minimizing errors in semiconductor manufacturing processes
Benefits: - Increased precision in photomask manufacturing - Enhanced performance of optical devices - Cost-effective production of semiconductor components
Commercial Applications: Title: Advanced Photomask Manufacturing Technology This technology can be utilized in the semiconductor industry for the production of high-quality photomasks, leading to improved efficiency and accuracy in semiconductor manufacturing processes.
Questions about Photomask Manufacturing Technology: 1. How does the displacement error correction map improve the accuracy of the target pattern formation? - The displacement error correction map helps to compensate for any errors in the target pattern, ensuring that the final photomask is produced with high precision.
2. What are the key advantages of using this method in semiconductor manufacturing? - This method offers increased accuracy, efficiency, and cost-effectiveness in the production of photomasks, leading to improved overall quality in semiconductor manufacturing processes.
Original Abstract Submitted
in a method of manufacturing a photomask, a layout of a target pattern to be formed in the photomask may be designed. a modeling of a displacement error of the target pattern may be performed and a displacement error correction map of the target pattern may be generated based on the modeling of the displacement error of the target pattern. an exposure process may be performed on a blank mask in reflection of the displacement error correction map of the target pattern. a developing process and an etching process may be performed on the blank mask to form the photomask.