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Category:CPC H01J37/32357
Pages in category "CPC H01J37/32357"
The following 30 pages are in this category, out of 30 total.
1
A
- Advanced Energy Industries, Inc. Patent Application Trends in 2025
- Applied materials, inc. (20240249918). Processing Chamber With Multiple Plasma Units simplified abstract
- Applied materials, inc. (20240412948). METHODS AND APPARATUS FOR RPS-RF PLASMA CLEAN AND ACTIVATION FOR ADVANCED SEMICONDUCTOR PACKAGING
- Applied materials, inc. (20250006465). Remote Plasma Source and Plasma Processing Chamber Having Same
- Applied materials, inc. (20250118538). REMOTE PLASMA SOURCE
- APPLIED MATERIALS, INC. Patent Application Trends in 2025
- Applied Materials, Inc. patent applications on April 10th, 2025
- Applied Materials, Inc. patent applications on December 12th, 2024
- Applied Materials, Inc. patent applications on January 2nd, 2025
- Applied Materials, Inc. patent applications on July 25th, 2024
L
S
- SAMSUNG ELECTRONICS CO., LTD Patent Application Trends in 2024
- Samsung Electronics Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2024
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2025
- SEMES CO., LTD. Patent Application Trends in 2024
T
- Taiwan Semiconductor Manufacturing Co., Ltd Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. Patent Application Trends in 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2025
- Tokyo Electron Limited Patent Application Trends in 2025
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