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Category:H01J37/147
Subcategories
This category has the following 11 subcategories, out of 11 total.
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Pages in category "H01J37/147"
The following 31 pages are in this category, out of 31 total.
1
- 18070640. Lattice Based Voltage Standoff simplified abstract (Applied Materials, Inc.)
- 18131271. APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM simplified abstract (Applied Materials, Inc.)
- 18131287. HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM simplified abstract (Applied Materials, Inc.)
- 18366322. APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18458075. SEMICONDUCTOR DEVICE simplified abstract (Kabushiki Kaisha Toshiba)
- 18458075. SEMICONDUCTOR DEVICE simplified abstract (Toshiba Electronic Devices & Storage Corporation)
- 18464243. DIRECT WRITING SYSTEM USED FOR ELECTRON BEAM LITHOGRAPHY simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18595532. ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS (KABUSHIKI KAISHA TOSHIBA)
- 18600212. ELECTRON BEAM MICROSCOPE simplified abstract (Carl Zeiss Microscopy GmbH)
- 18600289. PARTICLE BEAM MICROSCOPE simplified abstract (Carl Zeiss Microscopy GmbH)
- 18743011. CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD simplified abstract (ASML Netherlands B.V.)
- 18794582. CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION (Applied Materials, Inc.)
- 19007772. LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER (Applied Materials, Inc.)
A
- Applied materials, inc. (20240339287). APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM simplified abstract
- Applied materials, inc. (20240339288). HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM simplified abstract
- Applied materials, inc. (20250095958). CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
- Applied Materials, Inc. patent applications on March 20th, 2025
- Applied Materials, Inc. patent applications on October 10th, 2024
B
K
- Kabushiki kaisha toshiba (20240321545). SEMICONDUCTOR DEVICE simplified abstract
- Kabushiki kaisha toshiba (20250095951). ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS
- KABUSHIKI KAISHA TOSHIBA patent applications on March 20th, 2025
- Kabushiki Kaisha Toshiba patent applications on September 26th, 2024
S
- Samsung electronics co., ltd. (20240203688). APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING FOCUSED ION BEAM AND SCANNING ELECTRON MICROSCOPE SUPPORTED BY ELECTRON DIFFRACTION PATTERN simplified abstract
- Samsung Electronics Co., Ltd. patent applications on June 20th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on June 20th, 2024