18743011. CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD simplified abstract (ASML Netherlands B.V.)
CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD
Organization Name
Inventor(s)
Marijke Scotuzzi of Eindhoven (NL)
Albertus Victor Gerardus Mangnus of Eindhoven (NL)
Erwin Paul Smakman of Eindhoven (NL)
Jurgen Van Soest of Amersfoort (NL)
CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18743011 titled 'CHARGED-PARTICLE OPTICAL APPARATUS AND PROJECTION METHOD
The abstract describes a charged-particle optical apparatus that can project a multi-beam of charged particles. The apparatus includes a charged particle device that can switch between an operational configuration for projecting the multi-beam to a sample and a monitoring configuration for projecting the multi-beam to a detector.
- The apparatus can switch between projecting the multi-beam to a sample along an operational beam path and projecting it to a detector along a monitoring beam path.
- The monitoring beam path diverts from the operational beam path partway along the operational beam path.
Potential Applications: - Material analysis - Semiconductor manufacturing - Biological sample imaging
Problems Solved: - Efficient monitoring of charged particle beams - Simultaneous sample inspection and beam monitoring
Benefits: - Improved accuracy in sample analysis - Enhanced control over beam projection - Increased efficiency in beam monitoring
Commercial Applications: Title: Advanced Charged-Particle Optical Apparatus for Precision Analysis This technology can be used in industries such as semiconductor manufacturing, materials science, and biological research for precise analysis and monitoring of samples.
Prior Art: Researchers can explore prior patents related to charged-particle optical apparatuses and multi-beam projection technologies to understand the evolution of this field.
Frequently Updated Research: Researchers in the field of charged-particle optics are constantly developing new techniques and technologies to enhance the capabilities of charged-particle optical apparatuses. Stay updated on the latest advancements in this area to leverage cutting-edge innovations.
Questions about Charged-Particle Optical Apparatus: 1. How does the apparatus switch between the operational and monitoring configurations? The apparatus utilizes a mechanism to redirect the beam path from the sample to the detector for monitoring purposes. 2. What are the key advantages of using a multi-beam projection in charged-particle optical apparatuses? Multi-beam projection allows for simultaneous sample inspection and beam monitoring, improving efficiency and accuracy in analysis processes.
Original Abstract Submitted
A charged-particle optical apparatus configured to project a multi-beam of charged particles, the apparatus comprising: a charged particle device switchable between (i) an operational configuration in which the device is configured to project the multi-beam to a sample along an operational beam path extending from a source of the multi-beam to the sample and (ii) a monitoring configuration in which the device is configured to project the multi-beam to a detector along a monitoring beam path extending from the source to the detector; wherein the monitoring beam path diverts from the inspection beam path part way along the operational beam path.
