Applied materials, inc. (20250095958). CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
Organization Name
Inventor(s)
Frank Sinclair of Hartland ME US
Timothy Thomas of Portland OR US
CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
This abstract first appeared for US patent application 20250095958 titled 'CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
Original Abstract Submitted
an ion implanter may include an ion source to generate an ion beam. the ion implanter may include a set of beamline components to direct the ion beam to a substrate along a beam axis, as well as a process chamber to house the substrate to receive the ion beam. the ion implanter may include a conoscopy system, comprising: an illumination source to direct light to a substrate position; a first polarizer, having a first polarization axis, disposed between the illumination source and the substrate position; a second polarizer, the second polarizer being disposed to receive the light after passing through the substrate position. the conoscopy system may include a lens, to receive the light after passing through the substrate position, and a detector, to detect the light after passing through the lens.
