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18794582. CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION (Applied Materials, Inc.)

From WikiPatents

CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION

Organization Name

Applied Materials, Inc.

Inventor(s)

Frank Sinclair of Hartland ME US

Timothy Thomas of Portland OR US

Jinxin Fu of Fremont CA US

Micha Nixon of Sitriya IL

CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION

This abstract first appeared for US patent application 18794582 titled 'CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION

Original Abstract Submitted

An ion implanter may include an ion source to generate an ion beam. The ion implanter may include a set of beamline components to direct the ion beam to a substrate along a beam axis, as well as a process chamber to house the substrate to receive the ion beam. The ion implanter may include a conoscopy system, comprising: an illumination source to direct light to a substrate position; a first polarizer, having a first polarization axis, disposed between the illumination source and the substrate position; a second polarizer, the second polarizer being disposed to receive the light after passing through the substrate position. The conoscopy system may include a lens, to receive the light after passing through the substrate position, and a detector, to detect the light after passing through the lens.

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