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Category:C08F220/18
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This category has the following 13 subcategories, out of 13 total.
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Pages in category "C08F220/18"
The following 50 pages are in this category, out of 50 total.
1
- 17826234. POLYMERS FOR PHOTORESIST AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 17858417. QUANTUM DOT, COMPOSITION FOR PREPARING QUANTUM DOT COMPOSITE, QUANTUM DOT COMPOSITE, AND DISPLAY PANEL simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18047030. PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTOACID GENERATOR simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18259705. ENCAPSULATING COMPOSITION AND ORGANIC ELECTRONIC DEVICE COMPRISING SAME simplified abstract (LG Chem, Ltd.)
- 18269727. ADHESIVE WITH THERMALLY REVERSIBLE, COVALENT CROSSLINKS simplified abstract (3M INNOVATIVE PROPERTIES COMPANY)
- 18271390. RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER HAVING ALICYCLIC HYDROCARBON GROUP simplified abstract (NISSAN CHEMICAL CORPORATION)
- 18294679. PROCESS FOR MODIFYING AN AQUEOUS POLYMER LATEX simplified abstract (BASF SE)
- 18359901. ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, ELECTROSTATIC CHARGE IMAGE DEVELOPER, TONER CARTRIDGE, AND IMAGE FORMING APPARATUS simplified abstract (FUJIFILM Business Innovation Corp.)
- 18380852. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18407117. Bio-Electrode, And Method For Manufacturing The Same simplified abstract (Shin-Etsu Chemical Co., Ltd.)
- 18426062. RESIN COMPOSITION, ADHESIVE MEMBER, AND DISPLAY DEVICE simplified abstract (Samsung Display Co., LTD.)
- 18467889. TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION simplified abstract (FUJIFILM CORPORATION)
- 18490857. SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18493192. RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18500274. RESIN COMPOSITION, ADHESIVE MEMBER, AND DISPLAY DEVICE INCLUDING THE ADHESIVE MEMBER simplified abstract (Samsung Display Co., LTD.)
- 18527056. PHOTORESIST COMPOSITION INCLUDING PHOTOSENSITIVE POLYMER AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18536373. RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18536373. RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG SDI CO., LTD.)
- 18720807. ADHESIVE FILM, ADHESIVE SYSTEM, AND RELATED PROCESSES (3M INNOVATIVE PROPERTIES COMPANY)
- 18720968. EVOLVING RANDOM HETEROPOLYMERS TOWARDS CATALYTICALLY ACTIVE MATERIALS (Massachusetts Institute of Technology)
- 18720968. EVOLVING RANDOM HETEROPOLYMERS TOWARDS CATALYTICALLY ACTIVE MATERIALS (THE REGENTS OF THE UNIVERSITY OF CALIFORNIA)
- 18894398. FLUORINE-CONTAINING POLYMER AND FLUORINE-CONTAINING COMPOSITION (DAIKIN INDUSTRIES, LTD.)
- 18958283. BINDER COMPOSITIONS AND METHODS OF PREPARING AND USING THE SAME (BASF SE)
2
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- 3D Printing patent applications on February 15th, 2024
- 3D Printing patent applications on January 23rd, 2025
- 3m innovative properties company (20240343848). FREE-RADICALLY POLYMERIZABLE COMPOSITION, METHOD OF POLYMERIZING THE SAME, AND POLYMERIZED COMPOSITION simplified abstract
- 3m innovative properties company (20240343944). Preparation of High Molecular Weight Polymers with Minimal Gel Content simplified abstract
- 3M INNOVATIVE PROPERTIES COMPANY patent applications on October 17th, 2024
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- Samsung display co., ltd. (20240240054). RESIN COMPOSITION, ADHESIVE MEMBER, AND DISPLAY DEVICE INCLUDING THE ADHESIVE MEMBER simplified abstract
- Samsung display co., ltd. (20240263053). RESIN COMPOSITION, ADHESIVE MEMBER, AND DISPLAY DEVICE simplified abstract
- Samsung Display Co., LTD. patent applications on August 8th, 2024
- Samsung Display Co., LTD. patent applications on July 18th, 2024
- Samsung electronics co., ltd. (20240302742). PHOTORESIST COMPOSITION INCLUDING PHOTOSENSITIVE POLYMER AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract
- Samsung electronics co., ltd. (20240319594). RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 8th, 2024
- Samsung Electronics Co., Ltd. patent applications on September 12th, 2024
- Samsung Electronics Co., Ltd. patent applications on September 26th, 2024
- Shin-etsu chemical co., ltd. (20240337938). RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract
- SHIN-ETSU CHEMICAL CO., LTD. patent applications on October 10th, 2024
U
- US Patent Application 18032496. THERMOPLASTIC RESIN AND MOLDED ARTICLE MANUFACTURED USING THE SAME simplified abstract
- US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract
