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Category:B24B37/015
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This category has the following 11 subcategories, out of 11 total.
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Pages in category "B24B37/015"
The following 25 pages are in this category, out of 25 total.
1
- 18396918. CHEMICAL MECHANICAL POLISHING APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18417304. APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL simplified abstract (Applied Materials, Inc.)
- 18481761. COLD LIQUID POLISHING CONTROL (Applied Materials, Inc.)
- 18515780. SUBSTRATE POLISHING APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18536321. SUBSTRATE POLISHING APPARATUS AND METHOD OF POLISHING SUBSTRATE simplified abstract (Samsung Electronics Co., Ltd.)
- 18537574. METHOD FOR CMP TEMPERATURE CONTROL simplified abstract (Applied Materials, Inc.)
- 18541797. LIGHT INTENSITY ADJUSTMENT METHOD FOR OPTICAL FILM THICKNESS MEASURING DEVICE AND POLISHING APPARATUS simplified abstract (EBARA CORPORATION)
- 18669102. CHEMICAL MECHANICAL POLISHING METHOD simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.)
- 18977686. TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING (Applied Materials, Inc.)
A
- Applied materials, inc. (20240253183). APPARATUS AND METHOD FOR CONTROLLING SUBSTRATE POLISH EDGE UNIFORMITY simplified abstract
- Applied materials, inc. (20250108476). TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING
- Applied materials, inc. (20250114909). COLD LIQUID POLISHING CONTROL
- Applied Materials, Inc. patent applications on April 10th, 2025
- Applied Materials, Inc. patent applications on April 3rd, 2025
- Applied Materials, Inc. patent applications on August 1st, 2024
S
- Samsung electronics co., ltd. (20240238935). CHEMICAL MECHANICAL POLISHING APPARATUS simplified abstract
- Samsung electronics co., ltd. (20240238939). SUBSTRATE POLISHING APPARATUS simplified abstract
- Samsung electronics co., ltd. (20240261930). SUBSTRATE POLISHING APPARATUS AND METHOD OF POLISHING SUBSTRATE simplified abstract
- Samsung Electronics Co., Ltd. patent applications on August 8th, 2024
- Samsung Electronics Co., Ltd. patent applications on July 18th, 2024
T
U
- US Patent Application 17824930. APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE simplified abstract
- US Patent Application 18100937. POLISHING PAD AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME simplified abstract
- US Patent Application 18359396. Chemical Mechanical Polishing Apparatus Including a Multi-Zone Platen simplified abstract