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Category:G03F7/038
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Pages in category "G03F7/038"
The following 25 pages are in this category, out of 25 total.
1
- 17741692. POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17873130. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18047688. METHOD FOR MANUFACTURING MICROSTRUCTURE, METHOD FOR MANUFACTURING LIQUID EJECTION HEAD, MICROSTRUCTURE AND LIQUID EJECTION HEAD simplified abstract (CANON KABUSHIKI KAISHA)
- 18056332. PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18164841. POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION simplified abstract (Samsung Electronics Co., Ltd.)
- 18373936. PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE simplified abstract (Samsung Display Co., LTD.)
- 18467889. TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION simplified abstract (FUJIFILM CORPORATION)
B
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- Samsung display co., ltd. (20240126169). PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE simplified abstract
- Samsung Display Co., LTD. patent applications on April 18th, 2024
- Samsung electronics co., ltd. (20240124635). POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE RESIST COMPOSITION simplified abstract
- Samsung Electronics Co., Ltd. patent applications on April 18th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 8th, 2024
T
U
- US Patent Application 17734975. POLYMER CROSSLINK DE-CROSSLINK PROCESSES FOR RESIST PATTERNING simplified abstract
- US Patent Application 18232220. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract
- US Patent Application 18361402. BOTTOM ANTIREFLECTIVE COATING MATERIALS simplified abstract
- US Patent Application 18446562. Polymer Layer in Semiconductor Device and Method of Manufacture simplified abstract
- US Patent Application 18447441. PHOTORESIST WITH POLAR-ACID-LABILE-GROUP simplified abstract
- US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract