18056332. PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

HONGGU Im of Hwaseong-si (KR)

Sumin Kim of Suwon-si (KR)

Yechan Kim of Hwaseong-si (KR)

Jinjoo Kim of Seoul (KR)

Hyunwoo Kim of Seongnam-si (KR)

Sunghwan Park of Suwon-si (KR)

Juhyeon Park of Hwaseong-si (KR)

Jicheol Park of Anyang-si (KR)

Giyoung Song of Asan-si (KR)

Sukkoo Hong of Suwon-si (KR)

PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18056332 titled 'PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE

Simplified Explanation

The abstract of the patent application describes a photoresist composition that includes a photosensitive polymer, a photoacid generator (PAG), and a solvent.

• The photosensitive polymer contains a repeating unit of Chemical Formula 1.
• The photoacid generator (PAG) is included to enhance the photosensitivity of the composition.
• The solvent is used to dissolve the polymer and PAG, creating a homogeneous mixture.

Potential Applications

This technology has potential applications in various fields, including:

• Semiconductor manufacturing: The photoresist composition can be used in lithography processes to pattern semiconductor devices.
• Printed circuit board (PCB) manufacturing: The composition can be used to create circuit patterns on PCBs.
• Microelectromechanical systems (MEMS): The photoresist composition can be utilized in the fabrication of MEMS devices.

Problems Solved

The technology addresses the following problems:

• Lack of photosensitivity: The inclusion of a photoacid generator (PAG) enhances the photosensitivity of the composition, allowing for more precise patterning.
• Inhomogeneous mixture: The solvent helps dissolve the photosensitive polymer and PAG, ensuring a homogeneous mixture that can be easily applied.

Benefits

The technology offers several benefits:

• Improved patterning accuracy: The enhanced photosensitivity of the composition enables more precise patterning of features.
• Ease of application: The homogeneous mixture created by the solvent allows for easy application of the photoresist composition.
• Versatility: The composition can be used in various manufacturing processes, making it suitable for different applications.

Original Abstract Submitted

Photoresist compositions may include a photosensitive polymer including a first repeating unit of Chemical Formula 1; a photoacid generator (PAG); and a solvent.