18047688. METHOD FOR MANUFACTURING MICROSTRUCTURE, METHOD FOR MANUFACTURING LIQUID EJECTION HEAD, MICROSTRUCTURE AND LIQUID EJECTION HEAD simplified abstract (CANON KABUSHIKI KAISHA)
Contents
- 1 METHOD FOR MANUFACTURING MICROSTRUCTURE, METHOD FOR MANUFACTURING LIQUID EJECTION HEAD, MICROSTRUCTURE AND LIQUID EJECTION HEAD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 METHOD FOR MANUFACTURING MICROSTRUCTURE, METHOD FOR MANUFACTURING LIQUID EJECTION HEAD, MICROSTRUCTURE AND LIQUID EJECTION HEAD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Original Abstract Submitted
METHOD FOR MANUFACTURING MICROSTRUCTURE, METHOD FOR MANUFACTURING LIQUID EJECTION HEAD, MICROSTRUCTURE AND LIQUID EJECTION HEAD
Organization Name
Inventor(s)
Kazunari Ishizuka of Shizuoka (JP)
Satoshi Tsutsui of Kanagawa (JP)
Hikaru Sugimoto of Kanagawa (JP)
METHOD FOR MANUFACTURING MICROSTRUCTURE, METHOD FOR MANUFACTURING LIQUID EJECTION HEAD, MICROSTRUCTURE AND LIQUID EJECTION HEAD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18047688 titled 'METHOD FOR MANUFACTURING MICROSTRUCTURE, METHOD FOR MANUFACTURING LIQUID EJECTION HEAD, MICROSTRUCTURE AND LIQUID EJECTION HEAD
Simplified Explanation
The patent application describes a method for manufacturing a microstructure using photosensitive resin compositions. The method involves forming multiple layers of the resin compositions, exposing each layer to patterning exposure, and developing the exposed layers to obtain the microstructure.
- The method involves using photosensitive resin compositions that contain a photopolymerization initiator.
- The layers of resin compositions are exposed to patterning exposure, which helps in creating the desired pattern or structure.
- The exposed layers are collectively developed to obtain the final microstructure.
- In at least one of the adjacent layers of the resin compositions, 90% or more of the photopolymerization initiators are nonionic photopolymerization initiators.
Potential Applications
- Manufacturing microstructures for various industries such as electronics, optics, and biomedical devices.
- Creating intricate patterns or structures for microfluidic devices, sensors, and microelectromechanical systems (MEMS).
Problems Solved
- Simplifies the manufacturing process of microstructures by using photosensitive resin compositions and patterning exposure.
- Provides a method for creating complex microstructures with high precision and accuracy.
- Allows for the use of nonionic photopolymerization initiators, which can enhance the performance and properties of the microstructures.
Benefits
- Enables the production of microstructures with improved functionality and performance.
- Reduces the complexity and cost of manufacturing microstructures.
- Provides a versatile method that can be applied to various industries and applications.
Original Abstract Submitted
A method for manufacturing a microstructure comprising cured products of photosensitive resin compositions, the method comprising: a step of forming at least two layers of the photosensitive resin compositions each comprising a photopolymerization initiator; a step of subjecting each of the formed at least two layers of the photosensitive resin compositions to patterning exposure; and a step of collectively developing the exposed at least two layers of the photosensitive resin compositions to obtain a microstructure, wherein in the at least two layers of the photosensitive resin compositions, 90% by mass or more of the photopolymerization initiators contained in at least one of the two adjacent layers of the photosensitive resin compositions is a nonionic photopolymerization initiator.
