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• US Patent Application 18187082. LITHOGRAPHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract
  ...APHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD= ...APHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD - A simplif ...
  2 KB (231 words) - 01:20, 30 October 2023
• METHOD FOR PERFORMING LITHOGRAPHY PROCESS, LIGHT SOURCE, AND EUV LITHOGRAPHY SYSTEM: abstract simplified (18326354)
  ...4 Titled 'METHOD FOR PERFORMING LITHOGRAPHY PROCESS, LIGHT SOURCE, AND EUV LITHOGRAPHY SYSTEM' The abstract describes a method for performing a lithography process, which is a technique used in semiconductor manufacturing to create ...
  2 KB (245 words) - 16:58, 16 October 2023
• US Patent Application 18326354. METHOD FOR PERFORMING LITHOGRAPHY PROCESS, LIGHT SOURCE, AND EUV LITHOGRAPHY SYSTEM simplified abstract
  =METHOD FOR PERFORMING LITHOGRAPHY PROCESS, LIGHT SOURCE, AND EUV LITHOGRAPHY SYSTEM= ==METHOD FOR PERFORMING LITHOGRAPHY PROCESS, LIGHT SOURCE, AND EUV LITHOGRAPHY SYSTEM - A simplified explanation of the abstract== ...
  2 KB (348 words) - 10:38, 18 October 2023
• US Patent Application 18299892. LITHOGRAPHY DEVICE, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract
  =LITHOGRAPHY DEVICE, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD= ==LITHOGRAPHY DEVICE, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the ...
  2 KB (320 words) - 00:11, 8 November 2023
• 18106091. LITHOGRAPHY MODEL GENERATING METHOD BASED ON DEEP LEARNING, AND MASK MANUFACTURING METHOD INCLUDING THE LITHOGRAPHY MODEL GENERATING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
  ...METHOD BASED ON DEEP LEARNING, AND MASK MANUFACTURING METHOD INCLUDING THE LITHOGRAPHY MODEL GENERATING METHOD= ...METHOD BASED ON DEEP LEARNING, AND MASK MANUFACTURING METHOD INCLUDING THE LITHOGRAPHY MODEL GENERATING METHOD - A simplified explanation of the abstract== ...
  3 KB (445 words) - 05:22, 1 January 2024
• Taiwan semiconductor manufacturing company, ltd. (20250147439). CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND METHOD OF CLEANING EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
  ...the laser to selectively vaporize the debris and limit damage to the euv) lithography system, and removing the vaporized debris.","applicationNumber":"2025014743 ...ULTRAVIOLET LITHOGRAPHY SYSTEM, AND METHOD OF CLEANING EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM= ...
  4 KB (472 words) - 05:34, 9 May 2025
• 19001857. CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND METHOD OF CLEANING EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM (Taiwan Semiconductor Manufacturing Company, Ltd.)
  ...the laser to selectively vaporize the debris and limit damage to the EUV) lithography system, and removing the vaporized debris.","applicationNumber":"19001857", ...ULTRAVIOLET LITHOGRAPHY SYSTEM, AND METHOD OF CLEANING EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM= ...
  4 KB (472 words) - 07:51, 9 May 2025
• 20250164892. Lithography Scanner Through (Taiwan Semiconductor Manufacturing , .)
  = LITHOGRAPHY SCANNER THROUGHPUT = ...d on an associated wafer is received and a default machine constant of the lithography scanner is determined. each of the plurality of rows is then identified cor ...
  2 KB (312 words) - 10:58, 25 May 2025
• Samsung electronics co., ltd. (20250123573). LITHOGRAPHY APPARATUS
  =LITHOGRAPHY APPARATUS= ==LITHOGRAPHY APPARATUS== ...
  2 KB (276 words) - 17:28, 17 April 2025
• 18757567. LITHOGRAPHY APPARATUS (Samsung Electronics Co., Ltd.)
  =LITHOGRAPHY APPARATUS= ==LITHOGRAPHY APPARATUS== ...
  2 KB (276 words) - 12:08, 18 April 2025
• Cellanome, Inc. (20250050301). SPATIAL BARCODES BY HYDROGEL LITHOGRAPHY
  =SPATIAL BARCODES BY HYDROGEL LITHOGRAPHY= ...
  144 bytes (15 words) - 01:12, 20 February 2025
• Intel corporation (20250110408). SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
  =SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY= ==SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY== ...
  2 KB (275 words) - 16:11, 3 April 2025
• 18375031. SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY (INTEL CORPORATION)
  =SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY= ==SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY== ...
  2 KB (275 words) - 15:28, 4 April 2025
• Taiwan semiconductor manufacturing co., ltd. (20250116937). LITHOGRAPHY PROCESS
  =LITHOGRAPHY PROCESS= ==LITHOGRAPHY PROCESS== ...
  1 KB (191 words) - 03:38, 11 April 2025
• 18481124. LITHOGRAPHY PROCESS (Taiwan Semiconductor Manufacturing Co., Ltd.)
  =LITHOGRAPHY PROCESS= ==LITHOGRAPHY PROCESS== ...
  1 KB (191 words) - 04:33, 11 April 2025
• Intel corporation (20250125260). ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES
  =ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES= ==ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES== ...
  2 KB (345 words) - 17:24, 17 April 2025
• 18999945. ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES (Intel Corporation)
  =ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES= ==ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES== ...
  2 KB (345 words) - 12:52, 18 April 2025
• Patent Application 18468438 - MOUNTING FOR A LITHOGRAPHY SYSTEM AND - Rejection
  = Patent Application 18468438 - MOUNTING FOR A LITHOGRAPHY SYSTEM AND = '''Title:''' MOUNTING FOR A LITHOGRAPHY SYSTEM, AND LITHOGRAPHY SYSTEM ...
  12 KB (1,865 words) - 15:59, 25 May 2025
• Taiwan semiconductor manufacturing co., ltd. (20240126174). LITHOGRAPHY simplified abstract
  =LITHOGRAPHY= ==LITHOGRAPHY - A simplified explanation of the abstract== ...
  3 KB (469 words) - 04:04, 26 April 2024
• Samsung electronics co., ltd. (20240353764). LITHOGRAPHY APPARATUS simplified abstract
  =LITHOGRAPHY APPARATUS= ==LITHOGRAPHY APPARATUS - A simplified explanation of the abstract== ...
  4 KB (514 words) - 05:54, 25 October 2024

Page text matches

• US Patent Application 18187082. LITHOGRAPHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract
  ...APHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD= ...APHY INFORMATION PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, STORAGE MEDIUM, LITHOGRAPHY INFORMATION PROCESSING METHOD, AND ARTICLE MANUFACTURING METHOD - A simplif ...
  2 KB (231 words) - 01:20, 30 October 2023
• US Patent Application 18299892. LITHOGRAPHY DEVICE, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract
  =LITHOGRAPHY DEVICE, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD= ==LITHOGRAPHY DEVICE, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the ...
  2 KB (320 words) - 00:11, 8 November 2023
• Taiwan semiconductor manufacturing company, ltd. (20240337949). LITHOGRAPHY SYSTEM AND METHODS simplified abstract
  =LITHOGRAPHY SYSTEM AND METHODS= ==LITHOGRAPHY SYSTEM AND METHODS - A simplified explanation of the abstract== ...
  3 KB (474 words) - 23:58, 13 October 2024
• Taiwan semiconductor manufacturing co., ltd. (20250102927). LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS
  =LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS= ==LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS== ...
  1 KB (212 words) - 03:47, 30 March 2025
• 18472779. LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
  =LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS= ==LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS== ...
  1 KB (212 words) - 04:45, 31 March 2025
• 18106091. LITHOGRAPHY MODEL GENERATING METHOD BASED ON DEEP LEARNING, AND MASK MANUFACTURING METHOD INCLUDING THE LITHOGRAPHY MODEL GENERATING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
  ...METHOD BASED ON DEEP LEARNING, AND MASK MANUFACTURING METHOD INCLUDING THE LITHOGRAPHY MODEL GENERATING METHOD= ...METHOD BASED ON DEEP LEARNING, AND MASK MANUFACTURING METHOD INCLUDING THE LITHOGRAPHY MODEL GENERATING METHOD - A simplified explanation of the abstract== ...
  3 KB (445 words) - 05:22, 1 January 2024
• Taiwan semiconductor manufacturing company, ltd. (20250147439). CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND METHOD OF CLEANING EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
  ...the laser to selectively vaporize the debris and limit damage to the euv) lithography system, and removing the vaporized debris.","applicationNumber":"2025014743 ...ULTRAVIOLET LITHOGRAPHY SYSTEM, AND METHOD OF CLEANING EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM= ...
  4 KB (472 words) - 05:34, 9 May 2025
• Taiwan semiconductor manufacturing co., ltd. (20250093762). EUV LITHOGRAPHY MASKS AND METHODS
  =EUV LITHOGRAPHY MASKS AND METHODS= ==EUV LITHOGRAPHY MASKS AND METHODS== ...
  1 KB (199 words) - 03:30, 24 March 2025
• 18434528. EUV LITHOGRAPHY MASKS AND METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
  =EUV LITHOGRAPHY MASKS AND METHODS= ==EUV LITHOGRAPHY MASKS AND METHODS== ...
  1 KB (199 words) - 04:52, 24 March 2025
• 19001857. CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND METHOD OF CLEANING EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM (Taiwan Semiconductor Manufacturing Company, Ltd.)
  ...the laser to selectively vaporize the debris and limit damage to the EUV) lithography system, and removing the vaporized debris.","applicationNumber":"19001857", ...ULTRAVIOLET LITHOGRAPHY SYSTEM, AND METHOD OF CLEANING EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM= ...
  4 KB (472 words) - 07:51, 9 May 2025
• US Patent Application 17717709. EUV LITHOGRAPHY APPARATUS AND OPERATING METHOD FOR MITIGATING CONTAMINATION simplified abstract
  =EUV LITHOGRAPHY APPARATUS AND OPERATING METHOD FOR MITIGATING CONTAMINATION= ==EUV LITHOGRAPHY APPARATUS AND OPERATING METHOD FOR MITIGATING CONTAMINATION - A simplified ...
  1 KB (214 words) - 10:38, 18 October 2023
• US Patent Application 18326354. METHOD FOR PERFORMING LITHOGRAPHY PROCESS, LIGHT SOURCE, AND EUV LITHOGRAPHY SYSTEM simplified abstract
  =METHOD FOR PERFORMING LITHOGRAPHY PROCESS, LIGHT SOURCE, AND EUV LITHOGRAPHY SYSTEM= ==METHOD FOR PERFORMING LITHOGRAPHY PROCESS, LIGHT SOURCE, AND EUV LITHOGRAPHY SYSTEM - A simplified explanation of the abstract== ...
  2 KB (348 words) - 10:38, 18 October 2023
• Taiwan semiconductor manufacturing co., ltd. (20250116937). LITHOGRAPHY PROCESS
  =LITHOGRAPHY PROCESS= ==LITHOGRAPHY PROCESS== ...
  1 KB (191 words) - 03:38, 11 April 2025
• 18481124. LITHOGRAPHY PROCESS (Taiwan Semiconductor Manufacturing Co., Ltd.)
  =LITHOGRAPHY PROCESS= ==LITHOGRAPHY PROCESS== ...
  1 KB (191 words) - 04:33, 11 April 2025
• 18669041. PHASE SHIFT MASK FOR EUV LITHOGRAPHY AND MANUFACTURING METHOD FOR THE PHASE SHIFT MASK simplified abstract (SK hynix Inc.)
  =PHASE SHIFT MASK FOR EUV LITHOGRAPHY AND MANUFACTURING METHOD FOR THE PHASE SHIFT MASK= ==PHASE SHIFT MASK FOR EUV LITHOGRAPHY AND MANUFACTURING METHOD FOR THE PHASE SHIFT MASK - A simplified explanatio ...
  3 KB (385 words) - 03:55, 1 October 2024
• The regents of the university of california (20240312783). MASK ABSORBER LAYERS FOR EXTREME ULTRAVIOLET LITHOGRAPHY simplified abstract
  =MASK ABSORBER LAYERS FOR EXTREME ULTRAVIOLET LITHOGRAPHY= ==MASK ABSORBER LAYERS FOR EXTREME ULTRAVIOLET LITHOGRAPHY - A simplified explanation of the abstract== ...
  4 KB (483 words) - 09:29, 19 September 2024
• 18675505. LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.)
  =LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS= ==LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS - A simplified explanation of the abstract= ...
  3 KB (401 words) - 09:54, 19 September 2024
• 18746751. LITHOGRAPHY SYSTEM AND METHODS simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
  =LITHOGRAPHY SYSTEM AND METHODS= ==LITHOGRAPHY SYSTEM AND METHODS - A simplified explanation of the abstract== ...
  3 KB (459 words) - 01:59, 18 October 2024
• Applied materials, inc. (20240280911). DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING simplified abstract
  =DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING= ==DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING - A simplified explanation of the abstract ...
  4 KB (487 words) - 09:36, 22 August 2024
• Intel corporation (20250004387). CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY
  =CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY= ==CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY== ...
  1 KB (165 words) - 02:36, 25 March 2025