Taiwan semiconductor manufacturing co., ltd. (20250093762). EUV LITHOGRAPHY MASKS AND METHODS
EUV LITHOGRAPHY MASKS AND METHODS
Organization Name
taiwan semiconductor manufacturing co., ltd.
Inventor(s)
EUV LITHOGRAPHY MASKS AND METHODS
This abstract first appeared for US patent application 20250093762 titled 'EUV LITHOGRAPHY MASKS AND METHODS
Original Abstract Submitted
an euv lithography mask including a substrate, a patterned absorber layer including a first material and a second material. in some embodiments, the first material is a second row transition metal and the second material is a first row transition metal or second row transition metal. the disclosed euv lithography masks reduce undesirable mask 3d effects.
