LITHOGRAPHY PROCESS

Organization Name

taiwan semiconductor manufacturing co., ltd.

Inventor(s)

Ming-Hui Weng of New Taipei City TW

Wei-Han Lai of New Taipei City TW

Hsien-Chung Huang of Hsinchu City TW

Ching-Yu Chang of Yilang County TW

LITHOGRAPHY PROCESS

This abstract first appeared for US patent application 20250116937 titled 'LITHOGRAPHY PROCESS

Original Abstract Submitted

a lithography method includes the steps which are mentioned below. a photoresist layer is formed over a substrate. the photoresist layer is exposed. the photoresist layer is developed. a vacuum treatment is performed to the photoresist layer. the substrate is etched by using the photoresist layer as an etch mask.