DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING

Organization Name

Inventor(s)

DOUGLAS Van Den Broeke of Sunnyvale CA (US)

DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240280911 titled 'DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING

Simplified Explanation: The patent application describes a digital lithography system with scan regions, exposure units, memory, and processing devices. The system is designed to pattern a substrate on a stage using exposure units associated with specific scan regions.

The digital lithography system includes scan regions, exposure units, memory, and processing devices.
Exposure units are located above the scan regions and include units associated with specific scan regions.
The processing device initiates a digital lithography process to pattern a substrate on the stage and performs exposure unit boundary smoothing during the process.

Key Features and Innovation:

Digital lithography system with scan regions and exposure units.
Exposure units associated with specific scan regions for precise patterning.
Processing device performs exposure unit boundary smoothing during lithography process.

Potential Applications:

Semiconductor manufacturing
Printed circuit board production
Microelectronics fabrication

Problems Solved:

Precise patterning of substrates
Smoothing exposure unit boundaries for accurate results

Benefits:

Improved accuracy in lithography processes
Enhanced quality of patterned substrates
Increased efficiency in manufacturing processes

Commercial Applications: Digital lithography systems like this could find applications in semiconductor manufacturing, printed circuit board production, and other microelectronics fabrication processes. The technology offers improved accuracy and efficiency in patterning substrates, making it valuable in various industries.

Questions about Digital Lithography Systems: 1. How does exposure unit boundary smoothing improve the lithography process? 2. What are the key advantages of using scan regions in a digital lithography system?

Original Abstract Submitted

a digital lithography system includes scan regions including a first scan region and a second scan region adjacent to the first scan region. the digital lithography system further includes exposure units located above the scan regions, a memory, and at least one processing device operatively coupled to the memory. the exposure units include a first exposure unit associated with the first scan region and a second exposure unit associated with the second scan region. the processing device is to perform operations including initiating a digital lithography process to pattern a substrate disposed on the stage in accordance with instructions, and performing exposure unit boundary smoothing with respect to the first and second exposure units during the digital lithography process.