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Category:G03F7/40
Subcategories
This category has the following 37 subcategories, out of 37 total.
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Pages in category "G03F7/40"
The following 74 pages are in this category, out of 74 total.
1
- 17674575. Photoresist and Method simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18145035. SYSTEM FOR EXPOSURE OF ULTRA-VIOLET LIGHT TO A PHOTORESIST DEVELOPER SOLUTION simplified abstract (Intel Corporation)
- 18145038. PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOTORESIST simplified abstract (Intel Corporation)
- 18216028. POST BAKING APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18230472. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18282509. PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS simplified abstract (Applied Materials, Inc.)
- 18387619. METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOTORESIST FILM STACK (Tokyo Electron Limited)
- 18481124. LITHOGRAPHY PROCESS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18489404. FABRICATION OF NANOIMPRINT WORKING STAMPS WITH COMBINED PATTERNS FROM MULTIPLE MASTER STAMPS simplified abstract (GOOGLE LLC)
- 18524767. FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING simplified abstract (TOKYO ELECTRON LIMITED)
- 18545644. SUBSTRATE TRANSFERRING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18574492. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD (Tokyo Electron Limited)
- 18609833. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18642711. PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
- 18652444. APPARATUS AND METHOD FOR ASSESSING PHOTORESIST RINSE SOLUTION (SAMSUNG ELECTRONICS CO., LTD.)
- 18675505. LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.)
- 18769038. PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES (LAM RESEARCH CORPORATION)
- 18817618. Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process (Shin-Etsu Chemical Co., Ltd.)
- 18817771. Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process (Shin-Etsu Chemical Co., Ltd.)
- 18888542. MASK AND METHOD OF MANUFACTURING THE SAME (Samsung Display Co., LTD.)
- 18970324. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited)
- 19011395. LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT (Taiwan Semiconductor Manufacturing Company, Ltd.)
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- Fujifilm corporation (20240103374). TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, PATTERN FORMING METHOD USING THE SAME, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME simplified abstract
- Fujifilm corporation (20240295822). PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract
- Fujifilm corporation (20240427243). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Fujifilm corporation (20250004374). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Fujifilm corporation (20250004588). METHOD OF PRODUCING TOUCH SENSOR AND TOUCH SENSOR
- FUJIFILM CORPORATION patent applications on December 26th, 2024
- FUJIFILM CORPORATION patent applications on January 2nd, 2025
- FUJIFILM CORPORATION patent applications on March 28th, 2024
- FUJIFILM Corporation patent applications on September 5th, 2024
G
- Google llc (20240134271). FABRICATION OF NANOIMPRINT WORKING STAMPS WITH COMBINED PATTERNS FROM MULTIPLE MASTER STAMPS simplified abstract
- Google llc (20240231221). FABRICATION OF NANOIMPRINT WORKING STAMPS WITH COMBINED PATTERNS FROM MULTIPLE MASTER STAMPS simplified abstract
- GOOGLE LLC patent applications on April 25th, 2024
- GOOGLE LLC patent applications on July 11th, 2024
I
- Innolux corporation (20240295823). METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract
- InnoLux Corporation patent applications on September 5th, 2024
- Intel corporation (20240210821). PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOTORESIST simplified abstract
- Intel corporation (20240210835). SYSTEM FOR EXPOSURE OF ULTRA-VIOLET LIGHT TO A PHOTORESIST DEVELOPER SOLUTION simplified abstract
- Intel Corporation patent applications on June 27th, 2024
S
- Samsung display co., ltd. (20250102904). MASK AND METHOD OF MANUFACTURING THE SAME
- Samsung Display Co., LTD. patent applications on March 27th, 2025
- Samsung electronics co., ltd. (20240120232). SUBSTRATE TRANSFERRING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD simplified abstract
- Samsung electronics co., ltd. (20240192604). POST BAKING APPARATUS simplified abstract
- Samsung electronics co., ltd. (20250093784). APPARATUS AND METHOD FOR ASSESSING PHOTORESIST RINSE SOLUTION
- SAMSUNG ELECTRONICS CO., LTD. patent applications on April 11th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 13th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on June 13th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 14th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 20th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 20th, 2025
T
- Taiwan semiconductor manufacturing co., ltd. (20240310735). LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20250116937). LITHOGRAPHY PROCESS
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on April 10th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. patent applications on September 19th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240280903). PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240376303). PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377739). RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20250147424). LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 22nd, 2024
- Taiwan Semiconductor Manufacturing Company, LTD. patent applications on February 6th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on January 18th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on May 8th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
- Tokyo electron limited (20250149335). METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOTORESIST FILM STACK
- Tokyo Electron Limited patent applications on May 8th, 2025
U
- US Patent Application 18076591. SUBSTRATE WEIGHT MEASUREMENT APPARATUS, A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND A METHOD OF PROCESSING A SUBSTRATE USING THE SUBSTRATE PROCESSING APPARATUS simplified abstract
- US Patent Application 18232220. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18232264. PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18232774. UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract