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Category:G03F1/36
Subcategories
This category has the following 13 subcategories, out of 13 total.
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H
J
M
S
U
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Y
Pages in category "G03F1/36"
The following 102 pages are in this category, out of 102 total.
1
- 17671021. OPTICAL PROXIMITY CORRECTION METHOD USING CHIEF RAY ANGLE AND PHOTOLITHOGRAPHY METHOD INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 17812005. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17841734. MASK LAYOUT CORRECTION METHODS BASED ON MACHINE LEARNING, AND MASK MANUFACTURING METHODS INCLUDING THE CORRECTION METHODS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17860139. METHOD OF GENERATING CURVE SUB-RESOLUTION ASSIST FEATURE (SRAF), METHOD OF VERIFYING MASK RULE CHECK (MRC), AND METHOD OF MANUFACTURING MASK INCLUDING METHOD OF GENERATING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 17973514. ENHANCED MASK PATTERN-AWARE HEURISTICS FOR OPTICAL PROXIMITY CORRECTIONS FOR INTEGRATED CIRCUITS simplified abstract (Intel Corporation)
- 18103289. METHOD OF MANUFACTURING PHOTO MASKS AND SEMICONDUCTOR DEVICES simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18111785. OPTICAL PROXIMITY CORRECTION (OPC) METHOD, AND METHODS OF MANUFACTURING MASK USING THE OPC METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 18131436. OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AND METHOD OF MANUFACTURING MASK BY USING THE OPTICAL PROXIMITY CORRECTION METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18187309. OPTIMAL SCANNER MAPS AND FIELD LAYOUTS simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)
- 18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18326659. PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18330729. OPTICAL PROXIMITY CORRECTION METHOD AND PHOTOMASK FABRICATION METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18341124. METHODS OF TRAINING DEEP LEARNING MODELS FOR OPTICAL PROXIMITY CORRECTION, OPTICAL PROXIMITY CORRECTION METHODS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18362842. PIN ACCESS HYBRID CELL HEIGHT DESIGN AND SYSTEM simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18421580. OVERLAY MARK DESIGN ENABLING LARGE OVERLAY MEASUREMENT (KLA Corporation)
- 18421644. INTEGRATED CIRCUIT LAYOUT GENERATION METHOD simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18437779. OPTICAL PROXIMITY CORRECTION METHOD AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18442205. OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18449078. OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND METHOD OF MANUFACTURING MASK BY USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18522888. METHOD OF MAKING INTEGRATED CIRCUIT WITH ASYMMETRIC MIRRORED LAYOUT ANALOG CELLS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18526324. DEVICES WITH TRACK-BASED FILL (TBF) METAL PATTERNING simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18532473. PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD (SAMSUNG ELECTRONICS CO., LTD.)
- 18641386. SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18672836. GEOMETRIC MASK RULE CHECK WITH FAVORABLE AND UNFAVORABLE ZONES simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.)
- 18745211. METHOD OF MANUFACTURING PHOTO MASKS simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18814426. MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS (D2S, Inc.)
- 18814429. MASK OPTIMIZATION FOR LAYER BASED ON COMPARISON OF COMPONENTS IN LAYER TO COMPONENTS IN OTHER LAYERS (D2S, Inc.)
- 18814432. MASK OPTIMIZATION ACCOUNTING FOR MORE CRITICAL AND LESS CRITICAL OVERLAP REGIONS (D2S, Inc.)
- 18970834. METHODS FOR MAKING SEMICONDUCTOR-BASED INTEGRATED CIRCUITS (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.)
2
- 20240085777.PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (samsung electronics co., ltd.)
- 20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)
I
- Intel corporation (20240134269). ENHANCED MASK PATTERN-AWARE HEURISTICS FOR OPTICAL PROXIMITY CORRECTIONS FOR INTEGRATED CIRCUITS simplified abstract
- Intel corporation (20240231217). ENHANCED MASK PATTERN-AWARE HEURISTICS FOR OPTICAL PROXIMITY CORRECTIONS FOR INTEGRATED CIRCUITS simplified abstract
- Intel Corporation patent applications on April 25th, 2024
- Intel Corporation patent applications on July 11th, 2024
- International business machines corporation (20240319579). OPTIMAL SCANNER MAPS AND FIELD LAYOUTS simplified abstract
- INTERNATIONAL BUSINESS MACHINES CORPORATION patent applications on September 26th, 2024
K
M
S
- Samsung electronics co., ltd. (20240104287). LAYOUT DESIGN METHOD AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240160827). METHODS OF TRAINING DEEP LEARNING MODELS FOR OPTICAL PROXIMITY CORRECTION, OPTICAL PROXIMITY CORRECTION METHODS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240176227). OPTICAL PROXIMITY CORRECTION METHOD AND PHOTOMASK FABRICATION METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240201578). OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND METHOD OF MANUFACTURING MASK BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240265188). SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240280891). OPTICAL PROXIMITY CORRECTION (OPC) METHOD, AND METHODS OF MANUFACTURING MASK USING THE OPC METHOD simplified abstract
- Samsung electronics co., ltd. (20240353748). METHOD FOR GENERATING OPTICAL PROXIMITY CORRECTION MODEL AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240402587). METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
- Samsung electronics co., ltd. (20240402587). METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240402588). METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
- Samsung electronics co., ltd. (20240402588). METHOD FOR FABRICATING MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240413024). PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
- Samsung electronics co., ltd. (20240419084). OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
- Samsung electronics co., ltd. (20240427231). OPTICAL PROXIMITY CORRECTION METHOD AND MASK MANUFACTURING METHOD BY USING THE SAME
- Samsung electronics co., ltd. (20250004361). OPTICAL PROXIMITY CORRECTION METHOD AND SEMICONDUCTOR FABRICATION METHOD USING THE SAME
- Samsung electronics co., ltd. (20250076749). OPC METHOD AND MASK MANUFACTURING METHOD INCLUDING OPC METHOD
- Samsung Electronics Co., Ltd. patent applications on August 22nd, 2024
- Samsung Electronics Co., Ltd. patent applications on August 8th, 2024
- Samsung Electronics Co., Ltd. patent applications on December 12th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on December 12th, 2024
- Samsung Electronics Co., Ltd. patent applications on December 19th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on December 19th, 2024
- Samsung Electronics Co., Ltd. patent applications on December 26th, 2024
- Samsung Electronics Co., Ltd. patent applications on December 5th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 8th, 2024
- Samsung Electronics Co., Ltd. patent applications on January 23rd, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on January 23rd, 2025
- Samsung Electronics Co., Ltd. patent applications on January 2nd, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on January 2nd, 2025
- Samsung Electronics Co., Ltd. patent applications on January 30th, 2025
- Samsung Electronics Co., Ltd. patent applications on June 20th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on June 20th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 14th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 28th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 6th, 2025
- Samsung Electronics Co., Ltd. patent applications on May 16th, 2024
- Samsung Electronics Co., Ltd. patent applications on May 30th, 2024
- Samsung Electronics Co., Ltd. patent applications on October 24th, 2024
- Samsung Electronics Co., Ltd. patent applications on September 26th, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240095438). METHOD OF MAKING INTEGRATED CIRCUIT WITH ASYMMETRIC MIRRORED LAYOUT ANALOG CELLS simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240095439). DEVICES WITH TRACK-BASED FILL (TBF) METAL PATTERNING simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240160828). INTEGRATED CIRCUIT LAYOUT GENERATION METHOD simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240311545). GEOMETRIC MASK RULE CHECK WITH FAVORABLE AND UNFAVORABLE ZONES simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240330564). SEMICONDUCOTR DEVICE HAVING POWER RAIL WITH NON-LINEAR EDGE simplified abstract
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 21st, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on May 16th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. patent applications on September 19th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240201579). METHOD OF MANUFACTURING INTEGRATED CIRCUIT simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240337951). METHOD OF MANUFACTURING PHOTO MASKS simplified abstract
- Taiwan Semiconductor Manufacturing Company, LTD. patent applications on February 6th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on January 18th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on June 20th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on October 10th, 2024
U
- US Patent Application 18231070. OPTIMIZED MASK STITCHING simplified abstract
- US Patent Application 18354377. INTEGRATED CIRCUIT AND METHOD OF FORMING THE SAME simplified abstract
- US Patent Application 18359954. Mask Defect Prevention simplified abstract
- US Patent Application 18361815. SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18361879. OPTICAL PROXIMITY CORRECTION AND PHOTOMASKS simplified abstract
- US Patent Application 18362195. TRANSMISSION GATE STRUCTURE simplified abstract
- US Patent Application 18362889. IC DEVICE LAYOUT METHOD simplified abstract