Samsung electronics co., ltd. (20240413024). PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
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PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
This abstract first appeared for US patent application 20240413024 titled 'PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
Original Abstract Submitted
provided is a pattern inspection method including obtaining an image of a substrate on which a pattern is formed, extracting a contour based on the image, detecting positions of a target pattern based on the contour, generating pattern inspection data by performing a curve-fitting on the detected positions of the target pattern, and analyzing the pattern based on the pattern inspection data, wherein the curve-fitting is performed by using at least one of a sigmoid function, a hyperbolic tangent function, and a fermi-dirac function, and wherein the pattern inspection data includes a width in a first direction, a height in a second direction, and a pattern slope of the target pattern.