There is currently no text in this page. You can search for this page title in other pages, or search the related logs, but you do not have permission to create this page.
Category:CPC C23C16/045
Pages in category "CPC C23C16/045"
The following 34 pages are in this category, out of 34 total.
1
- 18118450. CHEMICAL VAPOR INFILTRATION TOOLING HOLE MODIFICATION FOR OPTIMIZING INFILTRATION IN CERAMIC MATRIX COMPOSITES simplified abstract (Raytheon Technologies Corporation)
- 18371708. Methods for Depositing Film Layers (Applied Materials, Inc.)
- 18520621. METHOD OF FORMING PATTERN STRUCTURE INCLUDING SILICON NITRIDE simplified abstract (SEMES CO., LTD.)
- 18914403. Method and system for filling a gap (ASM IP Holding B.V.)
2
- 20250163570. Method Apparatus (Tokyo Electron Limited)
- 20250171890. Embedding Method Su (Tokyo Electron Limited)
- 20250171891. Method Filling Gaps (ASM IP Holding B.V.)
- 20250171892. Apparatuses Methods Fo (ASM IP Holding B.V.)
- 20250188600. Sidewall Passivation (Lam Research)
- 20250207246. Reducing Capacitance (Lam Research)
- 20250207247. Methods That Utilize Ph (Tokyo Electron Limited)
- 20250230540. Seam Performance Impro (Applied Materials, .)
- 20250230541. Gapfill Process Using (Applied Materials, .)
A
L
R
- Raytheon technologies corporation (20240301547). CHEMICAL VAPOR INFILTRATION TOOLING HOLE MODIFICATION FOR OPTIMIZING INFILTRATION IN CERAMIC MATRIX COMPOSITES simplified abstract
- RAYTHEON TECHNOLOGIES CORPORATION Patent Application Trends in 2024
- Raytheon Technologies Corporation patent applications on September 12th, 2024
- RTX Corporation Patent Application Trends in 2024
T
- Taiwan Semiconductor Manufacturing Co., Ltd Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. Patent Application Trends in 2024
- The Board of Trustees of the Leland Stanford Junior University Patent Application Trends in 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2025
- Tokyo Electron Limited Patent Application Trends in 2025