There is currently no text in this page. You can search for this page title in other pages, or search the related logs, but you do not have permission to create this page.
Category:C23C14/50
Subcategories
This category has the following 23 subcategories, out of 23 total.
C
F
H
I
M
P
S
W
X
Y
Z
Pages in category "C23C14/50"
The following 60 pages are in this category, out of 60 total.
1
- 17384310. DEPOSITION SYSTEM AND METHOD simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17662107. SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17950046. Glassy Carbon Shutter Disk For Physical Vapor Deposition (PVD) Chamber simplified abstract (Applied Materials, Inc.)
- 18093138. Programmable Electrostatic Chuck to Enhance Aluminum Film Morphology simplified abstract (Applied Materials, Inc.)
- 18093141. Programmable ESC to Enhance Aluminum Film Morphology simplified abstract (Applied Materials, Inc.)
- 18098993. MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION simplified abstract (Applied Materials, Inc.)
- 18107049. DEPOSITION APPARATUS AND DRIVING METHOD THEREOF simplified abstract (SAMSUNG DISPLAY CO., LTD.)
- 18454702. METHOD OF PHYSICAL VAPOR DEPOSITION WITH INTERMIXING REDUCTION (Taiwan Semiconductor Manufacturing Company, LTD.)
- 18468863. DEPOSITION DEVICE simplified abstract (Samsung Display Co., Ltd.)
- 18477047. PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18477060. FILM FORMING APPARATUS AND FILM FORMING METHOD simplified abstract (Tokyo Electron Limited)
- 18511890. SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD simplified abstract (Tokyo Electron Limited)
- 18512324. CONSUMABLE COMPONENT TREATING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT simplified abstract (SEMES CO., LTD.)
- 18540331. SUBSTRATE PROCESSING DEVICE AND METHOD FOR MANUFACTURING SAME simplified abstract (LG DISPLAY CO., LTD.)
- 18541164. SUBSTRATE PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18617573. PVD SYSTEM AND COLLIMATOR simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18971510. MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION (Applied Materials, Inc.)
- 19010611. SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 19017901. FILM FORMATION APPARATUS AND FILM FORMATION METHOD OF GALLIUM NITRIDE FILM (Japan Display Inc.)
- 19017907. FILM FORMATION APPARATUS (Japan Display Inc.)
A
- Applied materials, inc. (20240247365). MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION simplified abstract
- Applied materials, inc. (20240263299). MODULE FOR FLIPPING SUBSTRATES IN VACUUM simplified abstract
- Applied materials, inc. (20240410078). IN-SITU FILM GROWTH RATE MONITORING APPARATUS, SYSTEMS, AND METHODS FOR SUBSTRATE PROCESSING
- Applied materials, inc. (20240412954). PROCESS CHAMBERS HAVING MULTIPLE COOLING PLATES
- Applied materials, inc. (20250101572). MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION
- Applied Materials, Inc. patent applications on August 8th, 2024
- Applied Materials, Inc. patent applications on December 12th, 2024
- Applied Materials, Inc. patent applications on July 25th, 2024
- Applied Materials, Inc. patent applications on March 27th, 2025
B
J
S
- Samsung display co., ltd. (20240093347). DEPOSITION DEVICE simplified abstract
- Samsung display co., ltd. (20240183029). DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME simplified abstract
- SAMSUNG DISPLAY CO., LTD. patent applications on February 1st, 2024
- Samsung Display Co., LTD. patent applications on June 6th, 2024
- Samsung Display Co., Ltd. patent applications on March 21st, 2024
- Samsung Display Co., Ltd. patent applications on March 6th, 2025
- Samsung electronics co., ltd. (20240287668). DLC FILM DEPOSITION APPARATUS, SEMICONDUCTOR MANUFACTURING SYSTEM INCLUDING THE DLC FILM DEPOSITION APPARATUS, AND SEMICONDUCOR MANUFACTURING METHOD USING THE DLC FILM DEPOSITION APPARATUS simplified abstract
- Samsung Electronics Co., Ltd. patent applications on August 29th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on August 29th, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240183025). FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCING simplified abstract
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on June 6th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240240306). PVD SYSTEM AND COLLIMATOR simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240258123). GAS FLOW ACCELERATOR TO PREVENT BUILDUP OF PROCESSING BYPRODUCT IN A MAIN PUMPING LINE OF A SEMICONDUCTOR PROCESSING TOOL
- Taiwan semiconductor manufacturing company, ltd. (20240258123). GAS FLOW ACCELERATOR TO PREVENT BUILDUP OF PROCESSING BYPRODUCT IN A MAIN PUMPING LINE OF A SEMICONDUCTOR PROCESSING TOOL simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240379400). WAFER CHUCK STRUCTURE WITH HOLES IN UPPER SURFACE TO IMPROVE TEMPERATURE UNIFORMITY simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20250066899). METHOD OF PHYSICAL VAPOR DEPOSITION WITH INTERMIXING REDUCTION
- Taiwan semiconductor manufacturing company, ltd. (20250137114). SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 1st, 2024
- Taiwan Semiconductor Manufacturing Company, LTD. patent applications on February 27th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on July 18th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on May 1st, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024