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Category:B24B53/017
Subcategories
This category has the following 5 subcategories, out of 5 total.
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Pages in category "B24B53/017"
The following 40 pages are in this category, out of 40 total.
1
- 17970434. GAS DELIVERY PALLET ASSEMBLY, CLEANING UNIT AND CHEMICAL MECHANICAL POLISHING SYSTEM HAVING THE SAME simplified abstract (Applied Materials, Inc.)
- 18097540. POLISHING APPARATUS FOR A SUBSTRATE AND POLISHING METHOD FOR A SUBSTRATE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18210107. SUBSTRATE POLISHING APPARATUS AND METHOD OF POLISHING SUBSTRATE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18214857. CONDITIONER AND CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18226873. CLEANER FOR CHEMICAL MECHANICAL POLISHING APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18230528. CHEMICAL MECHANICAL POLISHING (CMP) APPARATUS AND METHOD OF CONTROLLING THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
- 18307526. SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18418868. CHEMICAL MECHANICAL POLISHING APPARATUS AND CHEMICAL MECHANICAL POLISHING METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 18483070. HIGH PERFORMANCE CMP MULTIDISK APPARATUS (Applied Materials, Inc.)
- 18597077. CLEANING SYSTEM FOR POLISHING LIQUID DELIVERY ARM simplified abstract (Applied Materials, Inc.)
2
A
- Applied materials, inc. (20240253183). APPARATUS AND METHOD FOR CONTROLLING SUBSTRATE POLISH EDGE UNIFORMITY simplified abstract
- Applied materials, inc. (20250114908). HIGH PERFORMANCE CMP MULTIDISK APPARATUS
- Applied Materials, Inc. patent applications on April 10th, 2025
- Applied Materials, Inc. patent applications on August 1st, 2024
- Applied Materials, Inc. patent applications on February 6th, 2025
- Applied Materials, Inc. patent applications on March 6th, 2025
S
- Samsung electronics co., ltd. (20240173820). CONDITIONER AND CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240208005). CLEANER FOR CHEMICAL MECHANICAL POLISHING APPARATUS simplified abstract
- Samsung electronics co., ltd. (20240238936). CHEMICAL MECHANICAL POLISHING (CMP) APPARATUS AND METHOD OF CONTROLLING THEREOF simplified abstract
- Samsung electronics co., ltd. (20240278383). CHEMICAL MECHANICAL POLISHING APPARATUS AND CHEMICAL MECHANICAL POLISHING METHOD simplified abstract
- Samsung electronics co., ltd. (20240399538). PAD CONDITIONERS
- Samsung electronics co., ltd. (20240399538). PAD CONDITIONERS simplified abstract
- Samsung electronics co., ltd. (20240424627). CONDITIONING DISK REPLACEMENT APPARATUS AND METHOD
- Samsung Electronics Co., Ltd. patent applications on August 22nd, 2024
- Samsung Electronics Co., Ltd. patent applications on December 26th, 2024
- Samsung Electronics Co., Ltd. patent applications on December 5th, 2024
- Samsung Electronics Co., Ltd. patent applications on January 23rd, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on January 23rd, 2025
- Samsung Electronics Co., Ltd. patent applications on July 18th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 27th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 14th, 2024
- Samsung Electronics Co., Ltd. patent applications on May 30th, 2024
T
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on January 25th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240412977). SYSTEM AND METHOD FOR REMOVING IMPURITIES DURING CHEMICAL MECHANICAL PLANARIZATION
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on December 12th, 2024
