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Category:B08B7/00
Subcategories
This category has the following 19 subcategories, out of 19 total.
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Pages in category "B08B7/00"
The following 57 pages are in this category, out of 57 total.
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- 17662107. SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17836657. PLASMA PRECLEAN SYSTEM FOR CLUSTER TOOL simplified abstract (Applied Materials, Inc.)
- 17945910. ON-BOARD CLEANING OF TOOLING PARTS IN HYBRID BONDING TOOL simplified abstract (Applied Materials, Inc.)
- 17987591. ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING simplified abstract (Applied Materials, Inc.)
- 18054021. PARTICLE REMOVAL METHOD, PARTICLE REMOVAL APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18057397. APPARATUS FOR REMOVING A PHOTORESIST AND APPARATUS OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18081948. SUBSTRATE DRYING DEVICE AND METHOD OF DRYING SUBSTRATE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18093681. CLEANING OPERATIONS BASED ON DEPOSITION THICKNESS simplified abstract (Applied Materials, Inc.)
- 18455976. CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18507008. APPARATUS FOR PROCESSING SUBSTRATE simplified abstract (SEMES CO., LTD.)
- 18511890. SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD simplified abstract (Tokyo Electron Limited)
- 18519519. SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS simplified abstract (TOKYO ELECTRON LIMITED)
- 18584218. PROCESS CHAMBER CLEAN simplified abstract (Applied Materials, Inc.)
- 18598317. FOREIGN SUBSTANCE REMOVING METHOD, FILM FORMING METHOD, ARTICLE MANUFACTURING METHOD, AND FOREIGN SUBSTANCE REMOVING APPARATUS simplified abstract (CANON KABUSHIKI KAISHA)
- 18627651. SUBSTRATE PROCESSING APPARATUS USING SUPERCRITICAL FLUID AND DRIVING METHOD THEREOF (SAMSUNG ELECTRONICS CO., LTD.)
- 18653097. FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN simplified abstract (Applied Materials, Inc.)
- 18671174. METHOD AND DEVICE FOR CLEANING SUBSTRATES simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.)
- 18810623. SUBSTRATE DRYING DEVICE AND METHOD OF DRYING SUBSTRATE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18817216. CLEANING METHOD AND SYSTEM (CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED)
- 18887836. ELECTRONIC COMPONENT AND METHOD FOR CLEANING BONDING TOOL (Murata Manufacturing Co., Ltd.)
- 18944769. PARTICLE REMOVAL METHOD, PARTICLE REMOVAL APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE (CANON KABUSHIKI KAISHA)
- 18975080. APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE (SEMES CO., LTD.)
- 19010611. SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 19017085. METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE (Kioxia Corporation)
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- Canon kabushiki kaisha (20240091825). CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE simplified abstract
- Canon kabushiki kaisha (20240316603). FOREIGN SUBSTANCE REMOVING METHOD, FILM FORMING METHOD, ARTICLE MANUFACTURING METHOD, AND FOREIGN SUBSTANCE REMOVING APPARATUS simplified abstract
- Canon kabushiki kaisha (20250065381). PARTICLE REMOVAL METHOD, PARTICLE REMOVAL APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE
- CANON KABUSHIKI KAISHA patent applications on February 27th, 2025
- CANON KABUSHIKI KAISHA patent applications on March 21st, 2024
- CANON KABUSHIKI KAISHA patent applications on September 26th, 2024
- Contemporary amperex technology co., limited (20240424539). CLEANING APPARATUS, CLEANING METHOD, AND BATTERY PRODUCTION SYSTEM
- CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED patent applications on December 26th, 2024
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- Samsung display co., ltd. (20240292725). MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME simplified abstract
- Samsung Display Co., LTD. patent applications on August 29th, 2024
- Samsung electronics co., ltd. (20240412984). SUBSTRATE DRYING DEVICE AND METHOD OF DRYING SUBSTRATE USING THE SAME
- Samsung electronics co., ltd. (20250091101). SUBSTRATE PROCESSING APPARATUS USING SUPERCRITICAL FLUID AND DRIVING METHOD THEREOF
- Samsung Electronics Co., Ltd. patent applications on December 12th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on December 12th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 20th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 20th, 2025
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- Taiwan semiconductor manufacturing co., ltd. (20240310744). METHOD AND DEVICE FOR CLEANING SUBSTRATES simplified abstract
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. patent applications on September 19th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20250137114). SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on May 1st, 2025