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Category:LAM RESEARCH CORPORATION
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Pages in category "LAM RESEARCH CORPORATION"
The following 22 pages are in this category, out of 22 total.
1
- 18683605. COMPACT GAS SEPARATOR DEVICES CO-LOCATED ON SUBSTRATE PROCESSING SYSTEMS (LAM RESEARCH CORPORATION)
- 18684643. APPARATUSES FOR RADIATIVE HEATING OF AN EDGE REGION OF A SEMICONDUCTOR WAFER (LAM RESEARCH CORPORATION)
- 18688739. ATOMIC LAYER ETCHING USING BORON TRICHLORIDE (LAM RESEARCH CORPORATION)
- 18701384. SYSTEM AND METHOD FOR CARBON PLUG FORMATION (LAM RESEARCH CORPORATION)
- 18701429. MODULATING THERMAL CONDUCTIVITY TO CONTROL COOLING OF SHOWERHEAD (LAM RESEARCH CORPORATION)
- 18701439. VALVE MANIFOLD FOR SEMICONDUCTOR PROCESSING (LAM RESEARCH CORPORATION)
- 18701458. VALVE FOR SEMICONDUCTOR EQUIPMENT (LAM RESEARCH CORPORATION)
- 18701479. STRIP WITH BEVEL CLEANING (LAM RESEARCH CORPORATION)
- 18702320. EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE WAVEFORM TO EDGE RING (LAM RESEARCH CORPORATION)
- 18705932. MODIFICATION OF METAL-CONTAINING SURFACES IN HIGH ASPECT RATIO PLASMA ETCHING (LAM RESEARCH CORPORATION)
- 18769038. PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES (LAM RESEARCH CORPORATION)
- 18819298. CONNECTOR FOR SUBSTRATE SUPPORT WITH EMBEDDED TEMPERATURE SENSORS (LAM RESEARCH CORPORATION)
- 18988750. WAFER PLACEMENT CORRECTION IN INDEXED MULTI-STATION PROCESSING CHAMBERS (LAM RESEARCH CORPORATION)
- 19000022. ELECTROCHEMICAL DEPOSITION SYSTEM INCLUDING OPTICAL PROBES (LAM RESEARCH CORPORATION)
- 19000327. SENSOR DATA COMPRESSION IN A PLASMA TOOL (LAM RESEARCH CORPORATION)
- 19002171. SUBSTRATE PROCESSING APARATUSES WITH ROTATING MECHANISMS INCLUDING SHAFTS WITH GAS FLOW PATHS (LAM RESEARCH CORPORATION)