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Category:G03F1/62
Subcategories
This category has the following 12 subcategories, out of 12 total.
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Pages in category "G03F1/62"
The following 31 pages are in this category, out of 31 total.
1
- 17886053. INSPECTION METHOD FOR PELLICLE MEMBRANE OF LITHOGRAPHY SYSTEM simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18047342. PELLICLE AND METHOD OF USING THE SAME simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18125464. PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18133945. PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18186994. PROTECTIVE MEMBRANE FOR PHOTO LITHOGRAPHY, PELLICLE INCLUDING THE SAME, AND METHOD OF FORMING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18299301. PELLICLE FOR EUV EXPOSURE AND METHOD FOR MANUFACTURING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18404776. MULTILAYER PROTECTION COATING WITH LAYERS OF DIFFERENT FUNCTIONS ON CARBON NANOTUBE (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18516630. PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18578780. APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT simplified abstract (ASML Netherlands B.V.)
- 18708573. PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS (ASML Netherlands B.V.)
- 18978369. RETICLE CLEANING DEVICE AND METHOD OF USE (Taiwan Semiconductor Manufacturing Co., Ltd.)
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- Taiwan semiconductor manufacturing co., ltd. (20240094626). PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240094629). PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240329517). PELLICLE HAVING VENT HOLE simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20250085623). MULTILAYER PROTECTION COATING WITH LAYERS OF DIFFERENT FUNCTIONS ON CARBON NANOTUBE
- Taiwan semiconductor manufacturing co., ltd. (20250110414). RETICLE CLEANING DEVICE AND METHOD OF USE
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on April 3rd, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on February 1st, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 13th, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 21st, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240103358). SYSTEM AND STRUCTURE INCLUDING A PELLICLE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377724). PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20250060663). PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING THEREOF
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on February 15th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on February 20th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on March 28th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 6th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024