PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS

Organization Name

Inventor(s)

Zomer Silvester Houweling of Utrecht (NL)

Alexander Ludwig Klein of Eindhoven (NL)

PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS

This abstract first appeared for US patent application 18708573 titled 'PELLICLES AND MEMBRANES FOR USE IN A LITHOGRAPHIC APPARATUS

Original Abstract Submitted

A method for forming a pellicle for use in a lithographic apparatus is disclosed. The method includes: providing a porous membrane formed from a first material; applying at least one layer of two-dimensional material to at least one side of the porous membrane; and applying a capping layer to the at least one layer of two-dimensional material on at least one side of the porous membrane such that the at least one layer of two-dimensional material is disposed between the or each capping layer and the porous membrane. The at least one layer of two-dimensional material may act to close the adjacent side of the porous membrane and to form a smoother and flatter exterior surface of the pellicle. Advantageously, this may allow the porous membrane to be protected from etching while reducing EUV flare, regardless of the material used for the capping layer.