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Category:G03F1/22
Subcategories
This category has the following 9 subcategories, out of 9 total.
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Y
Pages in category "G03F1/22"
The following 44 pages are in this category, out of 44 total.
1
- 17690150. METHODS FOR CLEANING LITHOGRAPHY MASK simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18100409. METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18114126. PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18116684. PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18151416. EUV MASKS TO PREVENT CARBON CONTAMINATION simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18215485. CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY (Intel Corporation)
- 18294072. PELLICLE FOR EXPOSURE CAPABLE OF EASY ADJUSTMENT OF ATMOSPHERIC PRESSURE simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18313203. METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AREA OF HIGH-NA EUV EXPOSURE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18317328. EXTREME ULTRAVIOLET (EUV) PHOTOMASK simplified abstract (Samsung Electronics Co., Ltd.)
- 18373485. EUV MASK AND PELLICLE ASSEMBLY (Intel Corporation)
- 18654329. METHOD FOR FORMING STRUCTURE OF PELLICLE-MASK STRUCTURE WITH VENT STRUCTURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18671187. METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.)
- 18963055. EXTREME ULTRAVIOLET MASK (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 19005010. EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME (Taiwan Semiconductor Manufacturing Company, Ltd.)
I
S
- Samsung electronics co., ltd. (20240288785). CLEANING COMPOSITION AND METHOD OF CLEANING MASK BY USING THE SAME simplified abstract
- Samsung Electronics Co., Ltd. patent applications on August 29th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on August 29th, 2024
- Shin-etsu chemical co., ltd. (20240337921). PELLICLE FOR EXPOSURE CAPABLE OF EASY ADJUSTMENT OF ATMOSPHERIC PRESSURE simplified abstract
- SHIN-ETSU CHEMICAL CO., LTD. patent applications on October 10th, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240248387). METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AREA OF HIGH-NA EUV EXPOSURE simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240310743). METHODS AND APPARATUS FOR REDUCING HYDROGEN PERMEATION FROM LITHOGRAPHIC TOOL simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240329517). PELLICLE HAVING VENT HOLE simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20250093764). EXTREME ULTRAVIOLET MASK
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on February 1st, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on July 25th, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 20th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. patent applications on September 19th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240280894). METHOD FOR FORMING STRUCTURE OF PELLICLE-MASK STRUCTURE WITH VENT STRUCTURE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377722). MASK AND METHOD OF FORMING THE SAME simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20250147405). EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 22nd, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on February 29th, 2024
- Taiwan Semiconductor Manufacturing Company, LTD. patent applications on February 6th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on January 18th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 6th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on May 8th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024