Taiwan semiconductor manufacturing co., ltd. (20250093764). EXTREME ULTRAVIOLET MASK
EXTREME ULTRAVIOLET MASK
Organization Name
taiwan semiconductor manufacturing co., ltd.
Inventor(s)
Tsung-Chih Chien of Hsinchu TW
EXTREME ULTRAVIOLET MASK
This abstract first appeared for US patent application 20250093764 titled 'EXTREME ULTRAVIOLET MASK
Original Abstract Submitted
an extreme ultraviolet (euv) mask includes a multilayer mo/si stack comprising alternating mo and si layers disposed over a first major surface of a mask substrate, a capping layer made of ruthenium (ru) disposed over the multilayer mo/si stack, and an absorber layer on the capping layer. the euv mask includes a circuit pattern area and a particle attractive area, and the capping layer is exposed at bottoms of patterns in the particle attractive area.
