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Category:CPC H01J37/32165
Pages in category "CPC H01J37/32165"
The following 23 pages are in this category, out of 23 total.
1
- 18382809. FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS simplified abstract (Tokyo Electron Limited)
- 18396695. HIGH-FREQUENCY POWER SUPPLY SYSTEM simplified abstract (DAIHEN Corporation)
- 18453875. METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited)
- 18605996. PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM simplified abstract (Tokyo Electron Limited)
- 19001893. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited)
L
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- Samsung Display Co., LTD Patent Application Trends in 2024
- SAMSUNG DISPLAY CO., LTD. Patent Application Trends in 2024
- Samsung Display Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD Patent Application Trends in 2024
- Samsung Electronics Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2024
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- SEMES CO., LTD. Patent Application Trends in 2024
T
- Tokyo electron limited (20250149296). PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2025
- Tokyo Electron Limited Patent Application Trends in 2025
- Tokyo Electron Limited patent applications on May 8th, 2025