There is currently no text in this page. You can search for this page title in other pages, or search the related logs, but you do not have permission to create this page.
Category:G03F1/54
Subcategories
This category has the following 5 subcategories, out of 5 total.
M
R
S
T
Pages in category "G03F1/54"
The following 25 pages are in this category, out of 25 total.
1
- 18180210. REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18383543. REFLECTIVE MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18432842. METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASK simplified abstract (SK hynix Inc.)
- 18505485. Substrate with Film for Reflective Mask Blank, and Reflective Mask Blank simplified abstract (Shin-Etsu Chemical Co., Ltd.)
- 18600273. Optical Component with Apodized Mask simplified abstract (Apple Inc.)
- 18620107. PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS simplified abstract (Intel Corporation)
- 18982913. ELECTROCONDUCTIVE-FILM-COATED SUBSTRATE AND REFLECTIVE MASK BLANK (AGC Inc.)
A
I
S
- Samsung electronics co., ltd. (20240219824). REFLECTIVE MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- SAMSUNG ELECTRONICS CO., LTD. patent applications on January 25th, 2024
- Samsung Electronics Co., Ltd. patent applications on July 4th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on July 4th, 2024
- Sk hynix inc. (20240176226). METHOD FOR FABRICATING EUV MASK AND PHOTOMASK USING THE EUV MASK simplified abstract
- SK hynix Inc. patent applications on May 30th, 2024
T
- Taiwan semiconductor manufacturing company, ltd. (20240377720). EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377722). MASK AND METHOD OF FORMING THE SAME simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on February 8th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
U
- US Patent Application 18230968. EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF simplified abstract
- US Patent Application 18359954. Mask Defect Prevention simplified abstract
- US Patent Application 18366136. EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract
- US Patent Application 18366397. EUV PHOTOMASK AND RELATED METHODS simplified abstract