Intel corporation (20240241434). PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS simplified abstract
PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS
Organization Name
Inventor(s)
Yongbae Kim of San Jose CA (US)
PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240241434 titled 'PHOTOMASKS HAVING INTERMEDIATE BARRIER LAYERS
The abstract describes photomasks with intermediate barrier layers, including a multilayer region with alternating layers of different materials, a capping layer, and an intermediate layer separating the capping layer and the substrate.
- Photomasks with intermediate barrier layers
- Multilayer region with alternating layers of different materials
- Capping layer and intermediate layer for separation
- Third material in the intermediate layer different from the first and second materials
Potential Applications: - Semiconductor manufacturing - Photolithography processes - Integrated circuit fabrication
Problems Solved: - Enhanced precision in patterning - Improved durability of photomasks - Reduction of defects in semiconductor devices
Benefits: - Higher quality photomasks - Increased efficiency in manufacturing processes - Cost-effective production of semiconductor devices
Commercial Applications: Title: Advanced Photomasks for Semiconductor Manufacturing This technology can be utilized in the production of various semiconductor devices, such as microprocessors, memory chips, and sensors. It can benefit semiconductor manufacturers by improving the accuracy and reliability of photolithography processes, leading to higher yields and lower production costs.
Questions about Photomasks with Intermediate Barrier Layers: 1. How do photomasks with intermediate barrier layers improve semiconductor manufacturing processes?
Photomasks with intermediate barrier layers enhance precision in patterning and reduce defects in semiconductor devices, leading to higher quality products.
2. What are the key features of the multilayer region in photomasks with intermediate barrier layers?
The multilayer region consists of alternating layers of different materials, providing structural integrity and durability to the photomask.
Original Abstract Submitted
photomasks having intermediate barrier layers are disclosed. an example photomask comprises a substrate including a multilayer region, the multilayer region including alternating layers of a first material and a second material different from the first material, a capping layer, and an intermediate layer separating the capping layer and the substrate, the intermediate layer including a third material different from the first material and different from the second material.
