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Category:CPC H01L21/76816
Pages in category "CPC H01L21/76816"
The following 63 pages are in this category, out of 63 total.
1
- 18060986. ASYMMETRIC SKIP-LEVEL VIA STRUCTURE simplified abstract (International Business Machines Corporation)
- 18377513. SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18380312. SEMICONDUCTOR DEVICE STRUCTURE WITH REDUCED CRITICAL DIMENSION AND METHOD FOR PREPARING THE SAME (NANYA TECHNOLOGY CORPORATION)
- 18518714. SEMICONDUCTOR DEVICE STRUCTURE WITH REDUCED CRITICAL DIMENSION AND METHOD FOR PREPARING THE SAME (NANYA TECHNOLOGY CORPORATION)
- 18523401. WORDLINE CONTACT FORMATION FOR NAND DEVICE simplified abstract (Applied Materials, Inc.)
- 18533635. METHOD OF FORMING PATTERNS OF SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18618044. Selective Deposition of Barrier Layer simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18618815. SELF-ALIGNED BARRIER FOR METAL VIAS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18662083. SEMI-DAMASCENE STRUCTURE WITH DIELECTRIC HARDMASK LAYER simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
2
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- Nanya technology corporation (20250125190). SEMICONDUCTOR DEVICE STRUCTURE WITH REDUCED CRITICAL DIMENSION AND METHOD FOR PREPARING THE SAME
- Nanya technology corporation (20250125191). SEMICONDUCTOR DEVICE STRUCTURE WITH REDUCED CRITICAL DIMENSION AND METHOD FOR PREPARING THE SAME
- NANYA TECHNOLOGY CORPORATION patent applications on April 17th, 2025
- NVIDIA Corporation Patent Application Trends in 2024
- Nvidia Patent Application Trends in 2024
Q
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- SAMSUNG ELECTRONICS CO., LTD Patent Application Trends in 2024
- Samsung electronics co., ltd. (20240194521). METHOD OF FORMING PATTERNS OF SEMICONDUCTOR DEVICE simplified abstract
- Samsung electronics co., ltd. (20240297072). SEMI-DAMASCENE STRUCTURE WITH DIELECTRIC HARDMASK LAYER simplified abstract
- Samsung Electronics Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2024
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2025
- Samsung Electronics Co., Ltd. patent applications on June 13th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on June 13th, 2024
- Samsung Electronics Co., Ltd. patent applications on September 5th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on September 5th, 2024
T
- Tahoe Research, Ltd. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Co., Ltd Patent Application Trends in 2024
- Taiwan semiconductor manufacturing co., ltd. (20250118594). SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
- Taiwan Semiconductor Manufacturing Co., Ltd. Patent Application Trends in 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on April 10th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Company Patent Application Trends in 2025
- Taiwan semiconductor manufacturing company, ltd. (20240243009). SELF-ALIGNED BARRIER FOR METAL VIAS simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240266211). Selective Deposition of Barrier Layer simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 8th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on July 18th, 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2025
- Tokyo Electron Limited Patent Application Trends in 2025