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Category:CPC H01J37/32091
Pages in category "CPC H01J37/32091"
The following 27 pages are in this category, out of 27 total.
1
- 18612757. PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS simplified abstract (Applied Materials, Inc.)
- 18725503. HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH (Lam Research Corporation)
- 18935537. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
- 18935538. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
- 18955095. TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SHEATH SYSTEM (Lam Research Corporation)
L
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- Samsung Display Co., LTD Patent Application Trends in 2024
- SAMSUNG DISPLAY CO., LTD. Patent Application Trends in 2024
- Samsung Display Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD Patent Application Trends in 2024
- Samsung Electronics Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2024
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2025
- SEMES CO., LTD. Patent Application Trends in 2024
T
- Tokyo electron limited (20250149291). PLASMA PROCESSING APPARATUS
- Tokyo electron limited (20250149292). PLASMA PROCESSING APPARATUS
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
- TOKYO ELECTRON LIMITED Patent Application Trends in 2025
- Tokyo Electron Limited Patent Application Trends in 2025
- Tokyo Electron Limited patent applications on May 8th, 2025