PLASMA PROCESSING APPARATUS

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PLASMA PROCESSING APPARATUS

This abstract first appeared for US patent application 20250149292 titled 'PLASMA PROCESSING APPARATUS

Original Abstract Submitted

a plasma processing apparatus includes a processing container, a gas supply pipe that supplies a processing gas into the processing container, an exhaust unit that evacuates an inside of the processing container, a pair of electrodes arranged outside the processing container and positioned to face each other, a radio-frequency power supply that applies a radio-frequency power to the pair of the electrodes, thereby generating a capacitively-coupled plasma in the processing container, an inner tube provided in the processing container and having an opening, a substrate holder that is inserted into the inner tube and holds a plurality of substrates, a rotating shaft that supports the substrate holder, a rotation mechanism that rotates the rotating shaft, and an elevation mechanism that raises or lowers the rotating shaft. the substrate holder includes a ring member that holds a substrate, and surrounds a radial outer side of the substrate in a plan view.