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Category:B24B37/20
Subcategories
This category has the following 4 subcategories, out of 4 total.
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Pages in category "B24B37/20"
The following 24 pages are in this category, out of 24 total.
1
- 18123746. COMPRESSION GAP CONTROL FOR PAD-BASED CHEMICAL BUFF POST CMP CLEANING simplified abstract (Applied Materials, Inc.)
- 18144711. CHEMICAL MECHANICAL POLISHING (CMP) APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18481513. INDIVIDUALLY ROTATABLE PLATENS AND CONTROL OF CARRIER HEAD SWEEP (Applied Materials, Inc.)
- 18481761. COLD LIQUID POLISHING CONTROL (Applied Materials, Inc.)
- 18759408. POLISHING APPARATUS AND TRANSPARENT-LIQUID FILLING METHOD (EBARA CORPORATION)
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- Samsung electronics co., ltd. (20240100647). SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract
- Samsung electronics co., ltd. (20240157502). CHEMICAL MECHANICAL POLISHING (CMP) APPARATUS simplified abstract
- Samsung electronics co., ltd. (20240269798). CONDITIONING APPARATUS simplified abstract
- Samsung electronics co., ltd. (20240399532). POLISHING HEAD AND SEGMENTATION TYPE HEAD MODULE OF A CHEMICAL MECHANICAL POLISHING APPARATUS
- Samsung electronics co., ltd. (20240399532). POLISHING HEAD AND SEGMENTATION TYPE HEAD MODULE OF A CHEMICAL MECHANICAL POLISHING APPARATUS simplified abstract
- Samsung Electronics Co., Ltd. patent applications on August 15th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on August 15th, 2024
- Samsung Electronics Co., Ltd. patent applications on December 5th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 28th, 2024
- Samsung Electronics Co., Ltd. patent applications on May 16th, 2024