Category:Akira Fujimura of Saratoga CA (US)
Akira Fujimura of Saratoga CA (US)
Executive Summary
Akira Fujimura of Saratoga CA (US) is an inventor who has filed 11 patents. Their primary areas of innovation include Circuit design at the physical level (physical level design for reconfigurable circuits (6 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (3 patents), ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models (3 patents), and they have worked with companies such as D2S, Inc. (11 patents). Their most frequent collaborators include (11 collaborations).
Patent Filing Activity
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Technology Areas
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List of Technology Areas
- G06F30/398 (Circuit design at the physical level (physical level design for reconfigurable circuits): 6 patents
- G03F1/36 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 3 patents
- G06F2119/18 (ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models): 3 patents
- G03F1/70 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
- G06F30/31 (ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models): 2 patents
- G06N3/08 (Learning methods): 2 patents
- G03F1/72 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
- G06F30/392 (Floor-planning or layout, e.g. partitioning or placement): 1 patents
- G06F2119/06 (ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models): 1 patents
Companies
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List of Companies
- D2S, Inc.: 11 patents
Collaborators
- Donald Oriordan of Sunnyvale CA (US) (11 collaborations)
Subcategories
This category has the following 2 subcategories, out of 2 total.
A
D
Pages in category "Akira Fujimura of Saratoga CA (US)"
The following 12 pages are in this category, out of 12 total.
1
- 18814425. HIGH ACCURACY PARASITICS EXTRACTION (D2S, Inc.)
- 18814426. MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS (D2S, Inc.)
- 18814428. MASK OPTIMIZATION FOR LAYER ACCOUNTING FOR OVERLAP WITH OTHER LAYERS (D2S, Inc.)
- 18814429. MASK OPTIMIZATION FOR LAYER BASED ON COMPARISON OF COMPONENTS IN LAYER TO COMPONENTS IN OTHER LAYERS (D2S, Inc.)
- 18814432. MASK OPTIMIZATION ACCOUNTING FOR MORE CRITICAL AND LESS CRITICAL OVERLAP REGIONS (D2S, Inc.)
- 18814436. ITERATIVE MASK OPTIMIZATION BIASED TOWARDS CRITICAL REGIONS OF LAYOUT (D2S, Inc.)
- 18814439. CONCURRENT MASK OPTIMIZATION FOR MULTIPLE LAYERS (D2S, Inc.)
- 18814442. PARASITICS EXTRACTION BASED ON MULTIPLE MANUFACTURING PROCESS VARIATIONS (D2S, Inc.)
- 18814444. GENERATION OF 3-D SHAPES FOR EDA OPERATIONS (D2S, Inc.)
- 18814446. GENERATION OF 3-D SHAPES FOR EDA OPERATIONS (D2S, Inc.)
- 18814447. VARIATION IN TAPER ANGLES OF PREDICTED MANUFACTURED SHAPES FOR PARASITICS EXTRACTION (D2S, Inc.)