PITCH CHANGE BETWEEN METAL LINES

Organization Name

International Business Machines Corporation

Inventor(s)

Ruilong Xie of Niskayuna NY (US)

Nicholas Anthony Lanzillo of Wynantskill NY (US)

Brent A. Anderson of Jericho VT (US)

Albert M. Chu of Nashua NH (US)

Lawrence A. Clevenger of Saratoga Springs NY (US)

PITCH CHANGE BETWEEN METAL LINES

This abstract first appeared for US patent application 18345540 titled 'PITCH CHANGE BETWEEN METAL LINES

Original Abstract Submitted

A semiconductor structure including a device layer, a back end-of-line layer, and a backside power distribution layer. The backside power distribution layer includes a first line network with having a first pitch, and a second line network having a second pitch. The second pitch is greater than the first pitch. In one example, the second pitch is at least 7 times (7×) greater than the first pitch.