18333863. REDUCTION OF MIDDLE-OF-LINE RESISTANCE AND CAPACITANCE (INTERNATIONAL BUSINESS MACHINES CORPORATION)
REDUCTION OF MIDDLE-OF-LINE RESISTANCE AND CAPACITANCE
Organization Name
INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor(s)
Brent A. Anderson of Jericho VT (US)
Nicholas Anthony Lanzillo of Wynantskill NY (US)
Albert M. Chu of Nashua NH (US)
Ruilong Xie of Niskayuna NY (US)
Lawrence A. Clevenger of Saratoga Springs NY (US)
Reinaldo Vega of Mahopac NY (US)
REDUCTION OF MIDDLE-OF-LINE RESISTANCE AND CAPACITANCE
This abstract first appeared for US patent application 18333863 titled 'REDUCTION OF MIDDLE-OF-LINE RESISTANCE AND CAPACITANCE
Original Abstract Submitted
A semiconductor structure includes a plurality of vertical transport field effect transistors, and an interconnect structure connected to one of respective source/drain regions of at least two vertical transport field effect transistors of the plurality of vertical transport field effect transistors and respective gate regions of the at least two vertical transport field effect transistors. The interconnect structure comprises a damascene portion, and a subtractive portion disposed on the damascene portion.
- INTERNATIONAL BUSINESS MACHINES CORPORATION
- Brent A. Anderson of Jericho VT (US)
- Nicholas Anthony Lanzillo of Wynantskill NY (US)
- Albert M. Chu of Nashua NH (US)
- Ruilong Xie of Niskayuna NY (US)
- Lawrence A. Clevenger of Saratoga Springs NY (US)
- Reinaldo Vega of Mahopac NY (US)
- H01L23/528
- H01L21/768
- H01L23/522
- CPC H01L23/5283