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Category:G03F7/09
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This category has the following 16 subcategories, out of 16 total.
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Pages in category "G03F7/09"
The following 60 pages are in this category, out of 60 total.
1
- 17390835. Methods for Making Probe Arrays Utilizing Deformed Templates simplified abstract (Microfabrica Inc.)
- 17736821. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 17946355. HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 18083851. PHYSICALLY DETECTABLE ID INTRODUCED BY LITHOGRAPHY SRAF INSERTION FOR HETEROGENEOUS INTEGRATION simplified abstract (International Business Machines Corporation)
- 18107427. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18167741. SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18186413. Optical Device and Method of Manufacture simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18369321. HARDMASK STRUCTURE AND METHOD OF FORMING SEMICONDUCTOR STRUCTURE simplified abstract (NANYA TECHNOLOGY CORPORATION)
- 18369323. METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV) PHOTORESISTS (Tokyo Electron Limited)
- 18404434. PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18447673. PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18514254. MULTI-METAL FILL WITH SELF-ALIGNED PATTERNING AND DIELECTRIC WITH VOIDS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18588447. Resist Underlayer Film Material, Pattern Forming Method, And Method Of Forming Resist Underlayer Film simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18601541. Method For Forming Resist Underlayer Film And Patterning Process simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18626475. HEAT TREATMENT DEVICE AND TREATMENT METHOD simplified abstract (Tokyo Electron Limited)
- 18638436. SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18822004. FLOW CELLS (ILLUMINA, INC.)
- 18941798. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Company, LTD.)
- 18955235. PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION (CANON KABUSHIKI KAISHA)
- 18961391. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18968046. COATING COMPOSITION FOR PHOTOLITHOGRAPHY (Taiwan Semiconductor Manufacturing Co., Ltd.)
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- Samsung Display Co., LTD. patent applications on February 20th, 2025
- SAMSUNG DISPLAY CO., LTD. patent applications on February 8th, 2024
- Samsung electronics co., ltd. (20240377740). POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIST PATTERN, AND CURED FILM simplified abstract
- Samsung Electronics Co., Ltd. patent applications on February 6th, 2025
- Samsung Electronics Co., Ltd. patent applications on November 14th, 2024
- Shin-etsu chemical co., ltd. (20240337944). Resist Underlayer Film Material, Pattern Forming Method, And Method Of Forming Resist Underlayer Film simplified abstract
- SHIN-ETSU CHEMICAL CO., LTD. patent applications on October 10th, 2024
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- Taiwan semiconductor manufacturing co., ltd. (20240192601). PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240329535). DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20250085631). PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Taiwan semiconductor manufacturing co., ltd. (20250093779). METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Taiwan semiconductor manufacturing co., ltd. (20250095988). COATING COMPOSITION FOR PHOTOLITHOGRAPHY
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on June 13th, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 13th, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 20th, 2025
- Taiwan semiconductor manufacturing company, ltd. (20240210822). SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240282575). SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240319590). Optical Device and Method of Manufacture simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377743). BOTTOM ANTIREFLECTIVE COATING MATERIALS simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20250068075). METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 22nd, 2024
- Taiwan Semiconductor Manufacturing Company, LTD. patent applications on February 27th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on June 27th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 14th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on September 26th, 2024
- Tokyo electron limited (20240249940). HEAT TREATMENT DEVICE AND TREATMENT METHOD simplified abstract
- Tokyo Electron Limited patent applications on July 25th, 2024
