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Category:G03F7/039
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Pages in category "G03F7/039"
The following 121 pages are in this category, out of 121 total.
1
- 17741590. POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 17826234. POLYMERS FOR PHOTORESIST AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 17939153. ADDITIVE FOR PHOTORESIST, PHOTORESIST COMPOSITION FOR EUV INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18047030. PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTOACID GENERATOR simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18047688. METHOD FOR MANUFACTURING MICROSTRUCTURE, METHOD FOR MANUFACTURING LIQUID EJECTION HEAD, MICROSTRUCTURE AND LIQUID EJECTION HEAD simplified abstract (CANON KABUSHIKI KAISHA)
- 18080348. PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18190917. PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18192316. ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18302375. CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18344992. PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (Samsung Electronics Co., Ltd.)
- 18371016. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18376925. ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18377215. Onium Salt, Resist Composition, And Patterning Process simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18380852. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18403927. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18404434. PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18404506. ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS simplified abstract (Shin-Etsu Chemical Co., Ltd.)
- 18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
- 18412068. PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM simplified abstract (FUJIFILM Corporation)
- 18421949. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND simplified abstract (FUJIFILM Corporation)
- 18436721. ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18457908. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
- 18467889. TRANSFER FILM AND PHOTOSENSITIVE COMPOSITION simplified abstract (FUJIFILM CORPORATION)
- 18483911. POLYCARBOXYLATE COMPOUND, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18490857. SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18493192. RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18520093. METHODS FOR MAKING FLOW CELLS simplified abstract (ILLUMINA, INC.)
- 18590436. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18590834. RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18597253. ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18601039. CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18601794. METHOD OF PRODUCING MICROSTRUCTURE AND LIQUID EJECTION HEAD simplified abstract (CANON KABUSHIKI KAISHA)
- 18609116. METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING PHOTOSENSITIVE COMPOSITION simplified abstract (FUJIFILM Corporation)
- 18609833. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18611037. ANALYSIS METHOD OF PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF PHOTOSENSITIVE COMPOSITION, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
- 18612246. PHOTOREACTIVE POLYMER COMPOUND, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOUND simplified abstract (Samsung Electronics Co., Ltd.)
- 18626079. MICRO PATTERN MANUFACTURING METHOD USING PHOTOSENSITIVE RESIN COMPOUND simplified abstract (CANON KABUSHIKI KAISHA)
- 18639380. PHOTORESIST COMPOSITIONS INCLUDING A SULFONATE GROUP AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18642711. PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
- 18675505. LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.)
- 18808397. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, COMPOUND, AND RESIN (FUJIFILM CORPORATION)
- 18808427. ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE (FUJIFILM CORPORATION)
- 18829435. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18829508. RESIST COMPOSITION AND PATTERN FORMING PROCESS (SHIN-ETSU CHEMICAL CO., LTD.)
- 18890487. RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION (SAMSUNG SDI CO., LTD.)
- 18964266. PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN (Taiwan Semiconductor Manufacturing Co., Ltd.)
C
- Canon kabushiki kaisha (20240310729). METHOD OF PRODUCING MICROSTRUCTURE AND LIQUID EJECTION HEAD simplified abstract
- Canon kabushiki kaisha (20240345482). MICRO PATTERN MANUFACTURING METHOD USING PHOTOSENSITIVE RESIN COMPOUND simplified abstract
- CANON KABUSHIKI KAISHA patent applications on October 17th, 2024
- CANON KABUSHIKI KAISHA patent applications on September 19th, 2024
F
- Fujifilm corporation (20240241443). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract
- Fujifilm corporation (20240241444). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract
- Fujifilm corporation (20240280518). ANALYSIS METHOD OF PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF PHOTOSENSITIVE COMPOSITION, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE simplified abstract
- Fujifilm corporation (20240280915). METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING PHOTOSENSITIVE COMPOSITION simplified abstract
- Fujifilm corporation (20240295822). PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract
- Fujifilm corporation (20240427242). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
- Fujifilm corporation (20240427243). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Fujifilm corporation (20250004374). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Fujifilm corporation (20250004377). ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
- FUJIFILM Corporation patent applications on August 22nd, 2024
- FUJIFILM CORPORATION patent applications on December 26th, 2024
- FUJIFILM CORPORATION patent applications on January 2nd, 2025
- FUJIFILM Corporation patent applications on July 18th, 2024
- FUJIFILM Corporation patent applications on September 5th, 2024
I
S
- Samsung electronics co., ltd. (20240201588). ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240210832). PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240241438). PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240255847). ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240288771). SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract
- Samsung electronics co., ltd. (20240317672). POLYCARBOXYLATE COMPOUND, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240319594). RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240319595). PHOTOREACTIVE POLYMER COMPOUND, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOUND simplified abstract
- Samsung electronics co., ltd. (20240377740). POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIST PATTERN, AND CURED FILM simplified abstract
- Samsung electronics co., ltd. (20250021003). POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME
- Samsung electronics co., ltd. (20250102914). PHOTORESIST COMPOSITIONS INCLUDING A SULFONATE GROUP AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME
- Samsung Electronics Co., Ltd. patent applications on August 1st, 2024
- Samsung Electronics Co., Ltd. patent applications on August 29th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on August 29th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 8th, 2024
- Samsung Electronics Co., Ltd. patent applications on January 16th, 2025
- Samsung Electronics Co., Ltd. patent applications on July 18th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 20th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on June 20th, 2024
- Samsung Electronics Co., Ltd. patent applications on June 27th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 27th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 27th, 2025
- Samsung Electronics Co., Ltd. patent applications on November 14th, 2024
- Samsung Electronics Co., Ltd. patent applications on September 26th, 2024
- Samsung sdi co., ltd. (20250093777). RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
- SAMSUNG SDI CO., LTD. patent applications on February 6th, 2025
- SAMSUNG SDI CO., LTD. patent applications on March 20th, 2025
- Shin-etsu chemical co., ltd. (20240337927). ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS simplified abstract
- Shin-etsu chemical co., ltd. (20240337938). RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract
- Shin-etsu chemical co., ltd. (20240337939). CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS simplified abstract
- SHIN-ETSU CHEMICAL CO., LTD. patent applications on October 10th, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240310735). LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20250085631). PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Taiwan semiconductor manufacturing co., ltd. (20250093775). PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 13th, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 20th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. patent applications on September 19th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240134279). PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240280903). PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240288769). METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND PHOTORESIST COMPOSITION simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377743). BOTTOM ANTIREFLECTIVE COATING MATERIALS simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on April 25th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 22nd, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on August 29th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
U
- US Patent Application 17734975. POLYMER CROSSLINK DE-CROSSLINK PROCESSES FOR RESIST PATTERNING simplified abstract
- US Patent Application 17734981. CROSSLINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY simplified abstract
- US Patent Application 18232220. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18232717. PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN simplified abstract
- US Patent Application 18232774. UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- US Patent Application 18339622. LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE simplified abstract
- US Patent Application 18361402. BOTTOM ANTIREFLECTIVE COATING MATERIALS simplified abstract
- US Patent Application 18446562. Polymer Layer in Semiconductor Device and Method of Manufacture simplified abstract
- US Patent Application 18447441. PHOTORESIST WITH POLAR-ACID-LABILE-GROUP simplified abstract
- US Patent Application 18448505. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract
