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Category:CPC H10D30/6219
Pages in category "CPC H10D30/6219"
The following 22 pages are in this category, out of 22 total.
1
- 18617125. SEMICONDUCTOR DEVICE INCLUDING DUAL CONTACT STRUCTURES ON SOURCE/DRAIN REGION (SAMSUNG ELECTRONICS CO., LTD.)
- 18967154. NON-CONFORMAL OXIDE LINER AND MANUFACTURING METHODS THEREOF (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18968754. CONTACT FORMATION WITH REDUCED DOPANT LOSS AND INCREASED DIMENSIONS (Taiwan Semiconductor Manufacturing Co., Ltd.)
2
- 20250169102. Low-k Feature Formation Processes Structures Formed Ther (Taiwan Semiconductor Manufacturing , .)
- 20250220952. Backside Contact Structures (Intel)
- 20250234582. Method Forming Epitaxial Source/drain Features Semiconductor Devices Fabricated Ther (Taiwan Semiconductor Manufacturing , .)
- 20250234583. Forming Cavity Wet Etch Backside Contact Format (Taiwan Semiconductor Manufacturing , .)
I
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- Samsung electronics co., ltd. (20250142871). SEMICONDUCTOR DEVICE INCLUDING DUAL CONTACT STRUCTURES ON SOURCE/DRAIN REGION
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2025
- Samsung Electronics Co., Ltd. patent applications on May 1st, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on May 1st, 2025
T
- Taiwan semiconductor manufacturing co., ltd. (20250098205). NON-CONFORMAL OXIDE LINER AND MANUFACTURING METHODS THEREOF
- Taiwan semiconductor manufacturing co., ltd. (20250098206). CONTACT FORMATION WITH REDUCED DOPANT LOSS AND INCREASED DIMENSIONS
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 20th, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Company Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. Patent Application Trends in 2025