20250220952. Backside Contact Structures (Intel)
BACKSIDE CONTACT STRUCTURES AND FABRICATION FOR METAL ON BOTH SIDES OF DEVICES
Abstract: an apparatus including a circuit structure including a device stratum including a plurality of devices including a first side and an opposite second side; and a metal interconnect coupled to at least one of the plurality of devices from the second side of the device stratum. a method including forming a transistor device including a channel between a source region and a drain region and a gate electrode on the channel defining a first side of the device; and forming an interconnect to one of the source region and the drain region from a second side of the device.
Inventor(s): Patrick MORROW, Rishabh MEHANDRU, Aaron D. LILAK, Kimin JUN
CPC Classification: H10D30/6219 (No explanation available)
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