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Category:CPC G03F1/24
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Pages in category "CPC G03F1/24"
The following 70 pages are in this category, out of 70 total.
1
- 18383543. REFLECTIVE MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18395234. EXTREME ULTRAVIOLET MASK WITH TANTALUM BASE ALLOY ABSORBER simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18403811. REFLECTION TYPE MASK BLANK AND METHOD FOR MANUFACTURING SAME simplified abstract (AGC Inc.)
- 18407763. EXTREME ULTRA-VIOLET MASK AND MANUFACTURING METHOD THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
- 18413399. EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18415986. Extreme Ultraviolet (EUV) Mask and Method of Fabrication Thereof (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18434528. EUV LITHOGRAPHY MASKS AND METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18505485. Substrate with Film for Reflective Mask Blank, and Reflective Mask Blank simplified abstract (Shin-Etsu Chemical Co., Ltd.)
- 18545948. EXTREME ULTRAVIOLET MASK AND METHOD FOR FORMING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18616797. REFLECTIVE MASK BLANK, AND MANUFACTURING METHOD OF REFLECTIVE MASK simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18635209. Method Of Critical Dimension Control By Oxygen And Nitrogen Plasma Treatment In Euv Mask simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18658522. REFLECTIVE MASK simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18678622. PHOTOMASK ASSEMBLY AND SEMICONDUCTOR CHIP MANUFACTURED USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18745236. METHODS OF MAKING A SEMICONDUCTOR DEVICE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18749170. EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18818984. PHOTOMASK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18820061. REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD THEREFOR (AGC Inc.)
- 18823930. REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK (SHIN-ETSU CHEMICAL CO., LTD.)
- 18963055. EXTREME ULTRAVIOLET MASK (Taiwan Semiconductor Manufacturing Co., Ltd.)
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- SAMSUNG ELECTRONICS CO., LTD Patent Application Trends in 2024
- Samsung electronics co., ltd. (20240219824). REFLECTIVE MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20240280888). EXTREME ULTRA-VIOLET MASK AND MANUFACTURING METHOD THEREOF simplified abstract
- Samsung electronics co., ltd. (20240280889). EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME simplified abstract
- Samsung electronics co., ltd. (20250068050). PHOTOMASK ASSEMBLY AND SEMICONDUCTOR CHIP MANUFACTURED USING THE SAME
- Samsung electronics co., ltd. (20250093763). PHOTOMASK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME
- Samsung Electronics Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2024
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- Samsung Electronics Co., Ltd. patent applications on August 22nd, 2024
- Samsung Electronics Co., Ltd. patent applications on February 27th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on February 27th, 2025
- Samsung Electronics Co., Ltd. patent applications on July 4th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on July 4th, 2024
- Samsung Electronics Co., Ltd. patent applications on March 20th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 20th, 2025
- SCHOTT AG Patent Application Trends in 2024
- Shin-etsu chemical co., ltd. (20240337916). REFLECTIVE MASK BLANK, AND MANUFACTURING METHOD OF REFLECTIVE MASK simplified abstract
- Shin-Etsu Chemical Co., Ltd. Patent Application Trends in 2024
- SHIN-ETSU CHEMICAL CO., LTD. patent applications on October 10th, 2024
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- Taiwan Semiconductor Manufacturing Co., Ltd Patent Application Trends in 2024
- Taiwan semiconductor manufacturing co., ltd. (20240192581). EXTREME ULTRAVIOLET MASK WITH TANTALUM BASE ALLOY ABSORBER simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240192582). EXTREME ULTRAVIOLET MASK AND METHOD FOR FORMING THE SAME simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20250085622). Extreme Ultraviolet (EUV) Mask and Method of Fabrication Thereof
- Taiwan semiconductor manufacturing co., ltd. (20250093762). EUV LITHOGRAPHY MASKS AND METHODS
- Taiwan semiconductor manufacturing co., ltd. (20250093764). EXTREME ULTRAVIOLET MASK
- Taiwan Semiconductor Manufacturing Co., Ltd. Patent Application Trends in 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on January 30th, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on June 13th, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 13th, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on March 20th, 2025
- Taiwan semiconductor manufacturing company, ltd. (20240264520). Method Of Critical Dimension Control By Oxygen And Nitrogen Plasma Treatment In Euv Mask simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240302731). REFLECTIVE MASK simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240337917). METHODS OF MAKING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240337918). EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377720). EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on August 8th, 2024
- Taiwan Semiconductor Manufacturing Company, LTD. patent applications on February 13th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on October 10th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on September 12th, 2024
