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Category:C23C14/48
Subcategories
This category has the following 5 subcategories, out of 5 total.
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Pages in category "C23C14/48"
The following 16 pages are in this category, out of 16 total.
1
- 18101260. Dose Cup Assembly for an Ion Implanter simplified abstract (Applied Materials, Inc.)
- 18391541. LOW ENERGY TREATMENT TO PASSIVATE SiC SUBSTRATE DEFECTS (Applied Materials, Inc.)
- 18753697. METHOD FOR ION IMPLANTATION THAT ADJUSTS A TARGET'S TILT ANGLE BASED ON A DISTRIBUTION OF EJECTED IONS FROM A TARGET simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
A
- Applied materials, inc. (20240249908). Dose Cup Assembly for an Ion Implanter simplified abstract
- Applied materials, inc. (20240266186). STRESS MANAGEMENT FOR PRECISE SUBSTRATE -TO- SUBSTRATE BONDING simplified abstract
- Applied materials, inc. (20240266233). INFLUENCE FUNCTION-BASED MITIGATION OF SUBSTRATE DEFORMATION WITH FILM DEPOSITION AND ION IMPLANTATION simplified abstract
- Applied materials, inc. (20240411085). SELECTIVE WAVEGUIDE ION IMPLANTATION TO ADJUST LOCAL REFRACTIVE INDEX FOR PHOTONICS
- Applied materials, inc. (20250112043). LOW ENERGY TREATMENT TO PASSIVATE SiC SUBSTRATE DEFECTS
- Applied Materials, Inc. patent applications on April 3rd, 2025
- Applied Materials, Inc. patent applications on August 8th, 2024
- Applied Materials, Inc. patent applications on December 12th, 2024
- Applied Materials, Inc. patent applications on July 25th, 2024
- Applied Materials, Inc. patent applications on March 6th, 2025
T
- Taiwan semiconductor manufacturing company, ltd. (20240347341). METHOD FOR ION IMPLANTATION THAT ADJUSTS A TARGET'S TILT ANGLE BASED ON A DISTRIBUTION OF EJECTED IONS FROM A TARGET simplified abstract
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on October 17th, 2024
- TOYOTA JIDOSHA KABUSHIKI KAISHA patent applications on March 6th, 2025