Category:Zhepeng CONG of San Jose CA (US)

Zhepeng CONG of San Jose CA (US)

Executive Summary

Zhepeng CONG of San Jose CA (US) is an inventor who has filed 6 patents. Their primary areas of innovation include SINGLE-CRYSTAL GROWTH (by using ultra-high pressure, e.g. for the formation of diamonds, (2 patents), Gas-filled discharge tubes (heating by discharge (1 patents), Gas-filled discharge tubes (heating by discharge (1 patents), and they have worked with companies such as Applied Materials, Inc. (6 patents). Their most frequent collaborators include (3 collaborations), (3 collaborations), (2 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• C30B25/10 (SINGLE-CRYSTAL GROWTH (by using ultra-high pressure, e.g. for the formation of diamonds,): 2 patents
• H01J37/32449 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/321 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01J37/32522 (Gas-filled discharge tubes (heating by discharge): 1 patents
• H01L21/67017 ({Apparatus for fluid treatment (): 1 patents
• H01L21/67098 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
• C30B25/16 (SINGLE-CRYSTAL GROWTH (by using ultra-high pressure, e.g. for the formation of diamonds,): 1 patents
• C30B25/165 (SINGLE-CRYSTAL GROWTH (by using ultra-high pressure, e.g. for the formation of diamonds,): 1 patents
• G01K1/026 ({arrangements for monitoring a plurality of temperatures, e.g. by multiplexing}): 1 patents
• G01K3/08 (MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR (radiation pyrometry): 1 patents
• G01J5/80 (Calibration (using comparison with reference sources): 1 patents
• C30B25/12 (SINGLE-CRYSTAL GROWTH (by using ultra-high pressure, e.g. for the formation of diamonds,): 1 patents
• G01J5/0007 (Radiation pyrometry, e.g. infrared or optical thermometry): 1 patents
• H01L21/67248 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
• G05B19/041 (Programme control other than numerical control, i.e. in sequence controllers or logic controllers (): 1 patents
• H01L21/67109 ({mainly by convection}): 1 patents
• G05B2219/25056 (CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS (systems for controlling or regulating non-electric variables): 1 patents
• H01L21/67115 ({mainly by radiation}): 1 patents
• C23C16/4583 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• H01L21/68735 (using mechanical means, e.g. chucks, clamps or pinches {(using elecrostatic chucks): 1 patents
• H01L22/26 ({Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement (endpoint detection arrangements in CMP apparatus): 1 patents
• H01L21/67253 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents

Companies

List of Companies

• Applied Materials, Inc.: 6 patents

Collaborators

• Nimrod SMITH of Cupertino CA (US) (3 collaborations)
• Tao SHENG of Santa Clara CA (US) (3 collaborations)
• Ashur J. ATANOS of San Jose CA (US) (2 collaborations)
• Khokan C. PAUL of Cupertino CA (US) (2 collaborations)
• Ala MORADIAN of Sunnyvale CA (US) (2 collaborations)
• Vishwas Kumar PANDEY (1 collaborations)
• Karthik RAMANATHAN (1 collaborations)
• Manjunath SUBBANNA (1 collaborations)
• Vinh N. TRAN of San Jose CA (US) (1 collaborations)
• Alain DUBOUST of Sunnyvale CA (US) (1 collaborations)
• Nyi Oo MYO of San Jose CA (US) (1 collaborations)
• Zuoming ZHU of Sunnyvale CA (US) (1 collaborations)
• Shu-Kwan LAU of Sunnyvale CA (US) (1 collaborations)
• Enle CHOO of Saratoga CA (US) (1 collaborations)
• Flora Fong-Song CHANG of Saratoga CA (US) (1 collaborations)
• Vilen K. NESTOROV of Pleasanton CA (US) (1 collaborations)
• Zhiyuan YE of San Jose CA (US) (1 collaborations)
• Bindusagar MARATH SANKARATHODI of San Jose CA (US) (1 collaborations)
• Maxim D. SHAPOSHNIKOV of Sunnyvale CA (US) (1 collaborations)
• Surendra Singh SRIVASTAVA of Santa Clara CA (US) (1 collaborations)
• Patricia M. LIU of Saratoga CA (US) (1 collaborations)
• Errol Antonio C. SANCHEZ of Tracy CA (US) (1 collaborations)
• Jenny C. LIN of Saratoga CA (US) (1 collaborations)
• Schubert S. CHU of San Francisco CA (US) (1 collaborations)
• Balakrishnam R. JAMPANA of San Jose CA (US) (1 collaborations)