Category:Enle CHOO of Saratoga CA (US)

Enle CHOO of Saratoga CA (US)

Executive Summary

Enle CHOO of Saratoga CA (US) is an inventor who has filed 4 patents. Their primary areas of innovation include COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion (1 patents), Controlling or regulating the coating process {( (1 patents), SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES (1 patents), and they have worked with companies such as Applied Materials, Inc. (4 patents). Their most frequent collaborators include (4 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• C23C16/45561 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• C23C16/52 (Controlling or regulating the coating process {(): 1 patents
• G05D11/132 (SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES): 1 patents
• G05D7/0635 (SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES): 1 patents
• H01L22/26 ({Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement (endpoint detection arrangements in CMP apparatus): 1 patents
• H01L21/67253 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents
• F27B17/0025 (Furnaces of a kind not covered by any preceding group (structural combinations of furnaces): 1 patents
• H01L21/67115 ({mainly by radiation}): 1 patents
• H05B3/0047 (Ohmic-resistance heating): 1 patents

Companies

List of Companies

• Applied Materials, Inc.: 4 patents

Collaborators

• Shu-Kwan LAU of Sunnyvale CA (US) (4 collaborations)
• Martin TRUEMPER of Austin TX (US) (1 collaborations)
• Jason JEWELL of Santa Clara CA (US) (1 collaborations)
• Toshiyuki NAKAGAWA (1 collaborations)
• Zuoming ZHU of Sunnyvale CA (US) (1 collaborations)
• Ala MORADIAN of Sunnyvale CA (US) (1 collaborations)
• Flora Fong-Song CHANG of Saratoga CA (US) (1 collaborations)
• Vilen K. NESTOROV of Pleasanton CA (US) (1 collaborations)
• Zhiyuan YE of San Jose CA (US) (1 collaborations)
• Bindusagar MARATH SANKARATHODI of San Jose CA (US) (1 collaborations)
• Maxim D. SHAPOSHNIKOV of Sunnyvale CA (US) (1 collaborations)
• Surendra Singh SRIVASTAVA of Santa Clara CA (US) (1 collaborations)
• Zhepeng CONG of San Jose CA (US) (1 collaborations)
• Patricia M. LIU of Saratoga CA (US) (1 collaborations)
• Errol Antonio C. SANCHEZ of Tracy CA (US) (1 collaborations)
• Jenny C. LIN of Saratoga CA (US) (1 collaborations)
• Schubert S. CHU of San Francisco CA (US) (1 collaborations)
• Balakrishnam R. JAMPANA of San Jose CA (US) (1 collaborations)
• Raja Murali DHAMODHARAN (1 collaborations)
• Shainish NELLIKKA (1 collaborations)
• Kalaivanan MOHANADASS of Santa Clara CA (US) (1 collaborations)
• Aniketnitin PATIL of San Jose CA (US) (1 collaborations)